EP 0753795 A1 19970115 - Positive working photoresist composition
Title (en)
Positive working photoresist composition
Title (de)
Positiv arbeitende Photoresistzusammensetzung
Title (fr)
Composition pour photoréserve de type positif
Publication
Application
Priority
JP 17765595 A 19950713
Abstract (en)
Provided is a positive working photoresist composition which comprises a 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a specified phenol compound, formaldehyde and a specified aromatic aldehyde having at least one alkoxy substituent and at least one hydroxy substituent.
IPC 1-7
IPC 8 full level
G03F 7/023 (2006.01)
CPC (source: EP US)
G03F 7/0236 (2013.01 - EP US)
Citation (search report)
- [DY] US 5266440 A 19931130 - ZAMPINI ANTHONY [US]
- [DY] EP 0336604 A2 19891011 - THIOKOL MORTON INC [US]
- [A] EP 0676668 A1 19951011 - SUMITOMO CHEMICAL CO [JP]
- [X] US 5302490 A 19940412 - FEDYNYSHYN THEODORE H [US], et al
- [DY] DATABASE WPI Week 9108, Derwent World Patents Index; AN 91-053474, XP002016256
- [X] DATABASE WPI Week 8646, Derwent World Patents Index; AN 86-301835, XP002016257
Designated contracting state (EPC)
BE DE FR GB
DOCDB simple family (publication)
EP 0753795 A1 19970115; EP 0753795 B1 19991013; DE 69604623 D1 19991118; DE 69604623 T2 20000127; US 5709977 A 19980120
DOCDB simple family (application)
EP 96111286 A 19960712; DE 69604623 T 19960712; US 67714396 A 19960709