EP 0756015 A1 19970129 - Nickel-iron alloy for planar masks
Title (en)
Nickel-iron alloy for planar masks
Title (de)
Nickel-Eisen Legierung für Schattenmaske
Title (fr)
Alliage nickel-fer pour masque d'ombre tendu
Publication
Application
Priority
FR 9508642 A 19950718
Abstract (en)
Alloy is used to make a mask for use inside a cathode ray tube and comprises 69-83 wt.% Ni, and up to the following amounts of other elements with the residue being Fe: 7% Mo, 8% Cu, 1.5% Co, 7% W, 7% Nb, 7% V, 7% Cr, 7% Ta, 0.1% C, 1% Mn, 1% Si, 1.2% Ti, 1.2% Al, 1.2% Zr, 1.2% Hf and 0.010% S. The following equations also restrict the percentages: Co+Ni+1.5 x Cu ≥ 79.5%; 3 x (Co+Ni)-2 x Cu ≥ 206%; Co+Ni+7 x Cu ≤ 130%; 7 x(Co+Ni)+2 x Cu ≤ 581%; Mo+W+Nb+V+Cr+Ta ≤ 7%; Ti+Al+Zr+Hf ≤ 1.2%; C+Mn+Si ≤ 1%; 80.5 ≤ Co+Ni+0.80 x Cu ≤ 81.7%. The mask is also claimed.
Abstract (fr)
Utilisation d'une bande en alliage fer-nickel pour la fabrication d'un masque d'ombre tendu d'épaisseur e, exprimée en mm, la composition chimique de l'alliage fer-nickel comprenant, en poids:69% <= Ni <= 83%, 0% <= Mo <= 7%, 0% <= Cu <= 8%, 0% <= Co <= 1,5%, 0% <= W <= 7%, 0% <= Nb <= 7%, 0% <= V <= 7%, 0% <= Cr <= 7%, 0% <= Ta <= 7%, 0% <= C <= 0,1%, 0% <= Mn <= 1%, 0% <= Si <= 1%, 0% <= Ti <= 1,2%, 0% <= Al <= 1,2%, 0% <= Zr <= 1,2%, 0% <= Hf <= 1,2%, S <= 0,010%, le reste étant du fer et des impuretés résultant de l'élaboration; la composition chimique satisfaisant, en outre, les relations: Co+Ni+1,5xCu >= 79,5%; 3x(Co+Ni)-2xCu >= 206%; Co+Ni+7xCu <= 130%; 7x(Co+Ni)+2xCu <= 581%; Mo+W+Nb+V+Cr+Ta <= 7%, Ti+Al+Zr+Hf <= 1,2%; C+Mn+Si <= 1%; 80,5 <= Co+Ni+0,80xCu <= 81,7%. Masque d'ombre tendu obtenu.
IPC 1-7
IPC 8 full level
C22F 1/10 (2006.01); C22C 19/03 (2006.01)
CPC (source: EP KR US)
C22C 19/03 (2013.01 - EP US); H01J 9/02 (2013.01 - KR); H01J 29/07 (2013.01 - KR)
Citation (search report)
- [Y] DE 4336882 A1 19941103 - NIPPON KOKAN KK [JP]
- [Y] FR 2081632 A1 19711210 - ALLEGHENY LUDLUM IND INC
- [A] US 3269834 A 19660830 - LYKENS ARMAND A, et al
- [A] US 2990277 A 19610627 - POST CARL B, et al
- [Y] PATENT ABSTRACTS OF JAPAN vol. 14, no. 022 (E - 874) 17 January 1990 (1990-01-17)
- [A] PATENT ABSTRACTS OF JAPAN vol. 16, no. 556 (C - 1007) 26 November 1992 (1992-11-26)
- [A] PATENT ABSTRACTS OF JAPAN vol. 94, no. 010
Designated contracting state (EPC)
AT BE CH DE DK ES FI FR GB GR IE IT LI LU NL PT SE
DOCDB simple family (publication)
EP 0756015 A1 19970129; EP 0756015 B1 20001004; AT E196782 T1 20001015; DE 69610535 D1 20001109; DE 69610535 T2 20010607; ES 2150646 T3 20001201; FR 2737043 A1 19970124; FR 2737043 B1 19970814; JP H09184034 A 19970715; KR 100215522 B1 19990816; KR 970008304 A 19970224; PT 756015 E 20010131; TW 438895 B 20010607; US 5788783 A 19980804
DOCDB simple family (application)
EP 96401346 A 19960620; AT 96401346 T 19960620; DE 69610535 T 19960620; ES 96401346 T 19960620; FR 9508642 A 19950718; JP 20656296 A 19960717; KR 19960028852 A 19960716; PT 96401346 T 19960620; TW 85108466 A 19960712; US 68381596 A 19960718