EP 0759631 A1 19970226 - Process and apparatus for the fabrication of holes in a layer of photosensitive material, especially for the fabrication of electron sources
Title (en)
Process and apparatus for the fabrication of holes in a layer of photosensitive material, especially for the fabrication of electron sources
Title (de)
Verfahren und Vorrichtung zur Herstellung von Löchern in einer Schicht lichtempfindliches Materials, insbesondere zur Herstellung von Elektronenquellen
Title (fr)
Procédé et dispositif de formation de trous dans une couche de matériau photosensible, en particulier pour la fabrication de sources d'électrons
Publication
Application
Priority
FR 9509879 A 19950817
Abstract (en)
The method involves placement of an optical masking diaphragm (121) with micro-perforations (122) on the photosensitive layer (120), which is then irradiated with e.g. parallel ultraviolet rays (123). The portions (125) of the photosensitive layer exposed via the micro-perforations are removed by development after detachment of the diaphragm. The micro-perforations have diameters between 0.2 and 20 mu m and are distributed in a random manner but with substantially uniform density over the diaphragm, which may be held to the photosensitive layer by electrostatic forces.
Abstract (fr)
Ce procédé se caractérise en ce qu'on plaque sur la couche de matériau photosensible (120) une membrane (121) avec des microperforations (122) ; on insole la couche de matériau photosensible (120) à travers la membrane (121) pour impressionner des zones (125) correspondant aux microperforations (122) ; on sépare la membrane (121) de la couche de matériau photosensible (120) ainsi insolée, et on développe la couche photosensible (120) pour y former des trous correspondant aux zones insolées (125). <IMAGE>
IPC 1-7
IPC 8 full level
G03F 1/20 (2012.01); H01J 9/02 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
G03F 1/20 (2013.01 - EP US); H01J 9/025 (2013.01 - EP US)
Citation (search report)
- [A] US 5277638 A 19940111 - LEE KANGOK [KR]
- [A] US 4377633 A 19830322 - ABRAHAMOVICH KAREN M, et al
- [A] EP 0338625 A1 19891025 - PHILIPS NV [NL]
- [A] PATENT ABSTRACTS OF JAPAN vol. 013, no. 282 (M - 843) 28 June 1989 (1989-06-28)
- [A] PATENT ABSTRACTS OF JAPAN vol. 017, no. 302 (P - 1553) 10 June 1993 (1993-06-10)
Designated contracting state (EPC)
DE GB IT
DOCDB simple family (publication)
EP 0759631 A1 19970226; EP 0759631 B1 19991222; DE 69605734 D1 20000127; FR 2737927 A1 19970221; FR 2737927 B1 19970912; JP H09120771 A 19970506; US 5882845 A 19990316
DOCDB simple family (application)
EP 96401787 A 19960813; DE 69605734 T 19960813; FR 9509879 A 19950817; JP 21621296 A 19960816; US 69671796 A 19960814