EP 0779553 B1 20020502 - Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern formation using the same
Title (en)
Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern formation using the same
Title (de)
Fotoempfindliches Harz auf Basis von Polyvinylalkohol, fotoempfindliche Zusammensetzung, und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
Title (fr)
Résine photosensible à base d'alcool polyvinylique, composition photosensible contenant cette résine et méthode de fabrication de motifs utilisant cette composition
Publication
Application
Priority
- JP 32166295 A 19951211
- US 76341596 A 19961211
Abstract (en)
[origin: EP0779553A1] This invention is aimed at providing a photosensitive resin, a photosensitive resin composition, and a method for pattern-formation by which the excellent properties of water-resistance and heat-resistance, and sufficient water-solubility, and an excellent compatibility to an anionic additive can be attained. According to the invention, a photosensitive resin is provided as a polyvinyl alcohol base polymer compound obtained by suspending a styryl compound (I) having a nitrogen heterocyclic ring with a quaternary aromatic species and a phenyl compound (II) having two sulfone groups, in which the content of (1) is 0.5 to 10 mole % while the content of (II) is 0.1 to 20 mole %.
IPC 1-7
IPC 8 full level
C08F 8/00 (2006.01); C08F 16/38 (2006.01); G03F 7/004 (2006.01); G03F 7/008 (2006.01); G03F 7/031 (2006.01); G03F 7/033 (2006.01); G03F 7/038 (2006.01); G03F 7/12 (2006.01); H01J 9/227 (2006.01)
CPC (source: EP US)
C08F 8/00 (2013.01 - EP US); C08F 8/34 (2013.01 - EP US); G03F 7/033 (2013.01 - EP US); G03F 7/0388 (2013.01 - EP US)
Designated contracting state (EPC)
DE NL
DOCDB simple family (publication)
EP 0779553 A1 19970618; EP 0779553 B1 20020502; JP 3561061 B2 20040902; JP H09160240 A 19970620; US 5807657 A 19980915
DOCDB simple family (application)
EP 96119803 A 19961210; JP 32166295 A 19951211; US 76341596 A 19961211