EP 0792386 A4 20000105 - METHOD AND APPARATUS FOR DEPOSITING A SUBSTANCE WITH TEMPERATURE CONTROL
Title (en)
METHOD AND APPARATUS FOR DEPOSITING A SUBSTANCE WITH TEMPERATURE CONTROL
Title (de)
VERFAHREN UND VORRICHTUNG ZUR ABLAGERUNG VON SUBSTANZEN MIT TEMPERATURKONTROLLE
Title (fr)
PROCEDE ET APPAREIL PERMETTANT DE DEPOSER UNE SUBSTANCE DANS DES CONDITIONS DE TEMPERATURE REGULEE
Publication
Application
Priority
US 9412605 W 19941101
Abstract (en)
[origin: WO9613623A1] The present invention is directed to an apparatus and its method of use in which a substance such as diamond is deposited on a mandrel (110) or substrate (170), and where temperature at the deposition surface is controlled. According to one aspect of the invention, the temperature on the surface of a rotating mandrel (110) is controlled by passing coolant fluid radially through the mandrel at several angular reference positions in the mandrel, while a plasma containing, e.g., a hydrocarbon gas and hydrogen gas is directed toward the mandrel. A spacer (120) having a thermal conductance in its thickness direction that varies with its radial direction is mounted on the mandrel, and a substrate (170) is mounted on the spacer (120).
IPC 1-7
IPC 8 full level
C23C 16/26 (2006.01); C23C 16/27 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); C23C 16/513 (2006.01); H05H 1/46 (2006.01)
CPC (source: EP)
C23C 16/4584 (2013.01); C23C 16/513 (2013.01); H01J 2237/2001 (2013.01)
Citation (search report)
- [YD] US 5342660 A 19940830 - CANN GORDON L [US], et al
- [Y] ZHUANG Q D ET AL: "EFFECT OF SUBSTRATE TEMPERATURE DISTRIBUTION ON THERMAL PLASMA JET CVD OF DIAMOND", DIAMOND AND RELATED MATERIALS,NL,ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, vol. 3, no. 4/06, pages 319-324, XP000466659, ISSN: 0925-9635
- [A] LUGSCHEIDER E ET AL: "EXTENSIVE DIAMOND FILM DEPOSITION BY D.C. PLASMA JET CHEMICAL VAPORDEPOSITION", DIAMOND AND RELATED MATERIALS,NL,ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, vol. 3, no. 4/06, pages 325-327, XP000466660, ISSN: 0925-9635
- See references of WO 9613623A1
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 9613623 A1 19960509; EP 0792386 A1 19970903; EP 0792386 A4 20000105; JP H10508069 A 19980804
DOCDB simple family (application)
US 9412605 W 19941101; EP 95901749 A 19941101; JP 51452294 A 19941101