EP 0803579 A4 19980422 - PROCESS FOR THE VACUUM REFINING OF METAL AND ASSOCIATED DEVICE
Title (en)
PROCESS FOR THE VACUUM REFINING OF METAL AND ASSOCIATED DEVICE
Title (de)
VERFAHREN UND VORRICHTUNG ZUR VAKUUMRAFFINATION VON METALLEN
Title (fr)
DISPOSITIF D'AFFINAGE SOUS VIDE DE METAL ET DISPOSITIF ASSOCIE
Publication
Application
Priority
- RU 9400034 W 19940224
- RU 94000727 A 19940119
Abstract (en)
[origin: WO9520057A1] A process for the vacuum refining of metal involves lowering the pressure of the gas mixture on the surface of the metal melt until the partial pressures of the gases above the melt are lower than the partial pressures of the gases within it; and subjecting the metal to pressure pulses of 0.02-0.08 MPa in the low-frequency range 0.03-5 Hz while also simultaneously altering the pressure in the medium-frequency range 55-195 Hz from 0.005 to 0.01 MPa, and in the high-frequency range 350-3500 Hz from 0.0001 to 0.001 MPa. To that end, the proposed device for the vacuum refining of metal by the process described above comprises: an airtight chamber (1) with a gas outlet pipe (2); an ejector (3) comprising a housing (4), a nozzle (5) and a mixer channel (6); a unit (7) for creating low-frequency pulses in the working gas flowing through the nozzle (5) of the ejector (3); a unit (8) for creating medium-frequency pulses in the gas flow at the inlet to the gas outlet pipe (2); and a unit (10) for creating high-frequency pulses in the gas flow leaving the chamber (1), the latter being designed as a regulator for, in the present case, the flow-through section of the nozzle (5) which forms an insert (20).
IPC 1-7
IPC 8 full level
CPC (source: EP KR)
C21C 7/10 (2013.01 - EP KR); C22B 9/04 (2013.01 - EP); F27D 27/007 (2013.01 - KR)
Citation (search report)
- [A] GB 823419 A 19591111 - SIEMENS AG
- [A] US 3162908 A 19641229 - DE LUCA NOEL
- [A] DE 753613 C 19530223 - IG FARBENINDUSTRIE AG
- See references of WO 9520057A1
Designated contracting state (EPC)
AT BE DE ES FR GB IT LU SE
DOCDB simple family (publication)
WO 9520057 A1 19950727; CN 1145642 A 19970319; EP 0803579 A1 19971029; EP 0803579 A4 19980422; FI 962894 A0 19960718; FI 962894 A 19960918; JP H09508671 A 19970902; KR 970700781 A 19970212; RU 2046149 C1 19951020
DOCDB simple family (application)
RU 9400034 W 19940224; CN 94195066 A 19940224; EP 94909359 A 19940224; FI 962894 A 19960718; JP 51949795 A 19940224; KR 19960703886 A 19960719; RU 94000727 A 19940119