EP 0813109 A1 19971217 - Photographic element with improved scratch resistance
Title (en)
Photographic element with improved scratch resistance
Title (de)
Photographisches Element mit verbesserter Kratzfestigkeit
Title (fr)
Elément photographique ayant une résistance à l'abrasion améliorée
Publication
Application
Priority
US 66403196 A 19960613
Abstract (en)
A photographic element having improved scratch resistance and abrasion resistance is disclosed. The imaging element includes a support, at least one light-sensitive layer, and a protective layer. The protective layer has a UV ray absorbing dye layer which includes a UV ray absorbing dye, a high boiling point organic solvent and a hydrophilic binder. The protective layer has an outermost layer which includes a matting agent and a modified gelatin having at least one carboyxlic acid moiety where at least one carboxylic acid moiety of gelatin is modified into a monoamide of a polyamine whereby at least one additional amine group is introduced.
IPC 1-7
IPC 8 full level
G03C 1/047 (2006.01); G03C 1/76 (2006.01); G03C 1/815 (2006.01); G03C 1/95 (2006.01)
CPC (source: EP)
G03C 1/047 (2013.01); G03C 1/7614 (2013.01); G03C 1/815 (2013.01)
Citation (search report)
- [A] WO 9120014 A1 19911226 - EASTMAN KODAK CO [US]
- [A] EP 0614930 A1 19940914 - AGFA GEVAERT NV [BE]
- [A] GB 1477410 A 19770622 - FUJI PHOTO FILM CO LTD
- [A] US 4181527 A 19800101 - KOIZUMI JUNJI [JP], et al
Designated contracting state (EPC)
AT BE CH LI
DOCDB simple family (publication)
DOCDB simple family (application)
EP 97201695 A 19970604; JP 15669897 A 19970613