Global Patent Index - EP 0817231 A3

EP 0817231 A3 19981216 - Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus

Title (en)

Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus

Title (de)

Herstellungsverfahren und Gerät zur Herstellung einer Schattenmaske und eine bei diesen Verfahren und Vorrichtung benutzte Reinigungsvorrichtung

Title (fr)

Procédé et appareil pour le fabrication d'un masque d'ombre et dispositif de nettoyage utilisé dans le procédé et appareil pour la mise en oeuvre

Publication

EP 0817231 A3 19981216 (EN)

Application

EP 97110866 A 19970701

Priority

  • JP 17228096 A 19960702
  • JP 23552796 A 19960905
  • JP 26644496 A 19961008

Abstract (en)

[origin: EP0817231A2] A shadow mask manufacturing method comprising the cleaning step performs rapid cleaning by spraying a cleaning solution, which is inert with respect to the band-like thin metal plate, upon upper and lower surfaces of the band-like thin metal plate and thereby generating cavitation near the surfaces of the band-like thin metal plate by using cavitation jet means, while regulating a position of the band-like thin metal plate and preventing the cleaning solution from leaking in a direction opposite to the conveyance direction of the band-like thin metal plate by using a first leakage-preventing seal unit provided upstream the cavitation jet means. <IMAGE>

IPC 1-7

H01J 9/14

IPC 8 full level

H01J 9/14 (2006.01)

CPC (source: EP KR US)

C23F 1/02 (2013.01 - EP US); C23F 1/28 (2013.01 - EP US); H01J 9/142 (2013.01 - EP US); H01J 9/20 (2013.01 - KR); H01J 2209/017 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

EP 0817231 A2 19980107; EP 0817231 A3 19981216; EP 0817231 B1 20031008; CN 1123039 C 20031001; CN 1175074 A 19980304; DE 69725391 D1 20031113; DE 69725391 T2 20040722; KR 100224938 B1 19991015; KR 980011578 A 19980430; MY 125759 A 20060830; TW 373222 B 19991101; US 6193897 B1 20010227

DOCDB simple family (application)

EP 97110866 A 19970701; CN 97117133 A 19970702; DE 69725391 T 19970701; KR 19970031627 A 19970702; MY PI9702973 A 19970701; TW 86109050 A 19970627; US 88745697 A 19970702