Global Patent Index - EP 0829036 B1

EP 0829036 B1 20000913 - LITHOGRAPHIC SCANNING EXPOSURE PROJECTION APPARATUS

Title (en)

LITHOGRAPHIC SCANNING EXPOSURE PROJECTION APPARATUS

Title (de)

LITHOGRAPHISCHER PROJEKTIONSAPPARAT ZUR ABTASTBELICHTUNG

Title (fr)

INSOLATRICE LITHOGRAPHIQUE A EXPOSITION PAR BALAYAGE

Publication

EP 0829036 B1 20000913 (EN)

Application

EP 97906327 A 19970325

Priority

  • EP 97906327 A 19970325
  • EP 96200883 A 19960401
  • IB 9700297 W 19970325

Abstract (en)

[origin: WO9737283A1] A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning means (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.

IPC 1-7

G03F 7/20

IPC 8 full level

G03F 7/20 (2006.01); G03F 7/22 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR US)

G03F 7/20 (2013.01 - KR); G03F 7/70058 (2013.01 - EP US); G03F 7/70358 (2013.01 - EP US); G03F 7/70558 (2013.01 - EP US); G03F 7/70808 (2013.01 - EP US)

Designated contracting state (EPC)

DE FR GB NL

DOCDB simple family (publication)

WO 9737283 A1 19971009; DE 69703076 D1 20001019; DE 69703076 T2 20010503; EP 0829036 A1 19980318; EP 0829036 B1 20000913; EP 0829036 B9 20010725; JP 2006128732 A 20060518; JP 3813635 B2 20060823; JP H11507146 A 19990622; KR 100500770 B1 20051228; KR 19990022277 A 19990325; US 5986742 A 19991116

DOCDB simple family (application)

IB 9700297 W 19970325; DE 69703076 T 19970325; EP 97906327 A 19970325; JP 2006031781 A 20060209; JP 53508297 A 19970325; KR 19970708756 A 19971201; US 82462597 A 19970327