EP 0835723 A1 19980415 - A carrier head with a layer of conformable material for a chemical mechanical polishing system
Title (en)
A carrier head with a layer of conformable material for a chemical mechanical polishing system
Title (de)
Trägervorrichtung mit einer Lage anpassbarem Material für ein chemisch-mechanisches Poliersystem
Title (fr)
Dispositif de support comprenant une couche de matière conformable pour un système de polissage mécano-chimique
Publication
Application
Priority
- US 72868896 A 19961010
- US 72929896 A 19961010
Abstract (en)
The disclosure relates to a carrier head (100) for a chemical mechanical polishing apparatus. A layer of conformable material (308) is disposed in a recess of the carrier head to provide a mounting surface for a substrate (10). The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture (352) detachably connected to a backing fixture (350), a retaining ring (362) connected directly to the conformable material, and a shield ring (360) which projects over a portion of the layer of conformable material. <IMAGE> <IMAGE>
IPC 1-7
IPC 8 full level
B24B 37/04 (2006.01); H01L 21/304 (2006.01)
CPC (source: EP)
B24B 37/042 (2013.01); B24B 37/30 (2013.01)
Citation (search report)
- [X] US 5193316 A 19930316 - OLMSTEAD DENNIS L [US]
- [A] FR 2558095 A1 19850719 - RIBARD PIERRE [FR]
- [A] US 5449316 A 19950912 - STRASBAUGH ALAN [US]
- [A] US 5441444 A 19950815 - NAKAJIMA MAKOTO [JP]
Designated contracting state (EPC)
DE FR GB IE IT NL
DOCDB simple family (publication)
EP 0835723 A1 19980415; JP H10180626 A 19980707; KR 19980032714 A 19980725; TW 371635 B 19991011
DOCDB simple family (application)
EP 97308022 A 19971010; JP 31575297 A 19971013; KR 19970051922 A 19971010; TW 86114854 A 19971009