Global Patent Index - EP 0845151 A1

EP 0845151 A1 19980603 - RECESSED COIL FOR GENERATING A PLASMA

Title (en)

RECESSED COIL FOR GENERATING A PLASMA

Title (de)

VERSENKTE SPULE ZUR PLASMAERZEUGUNG

Title (fr)

BOBINAGE A EVIDEMENT SERVANT A GENERER UN PLASMA

Publication

EP 0845151 A1 19980603 (EN)

Application

EP 97925528 A 19970508

Priority

  • US 9708008 W 19970508
  • US 64718296 A 19960509

Abstract (en)

[origin: WO9742648A1] A recessed coil for a plasma chamber in a semiconductor fabrication system is provided. Recessing the coil reduces deposition of material onto the coil which in turn leads to a reduction in particulate matter shed by the coil onto the workpiece.

IPC 1-7

H01J 37/32; H01J 37/34

IPC 8 full level

H05H 1/46 (2006.01); C23C 14/35 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01); H01L 21/203 (2006.01); H01L 21/205 (2006.01); H01L 21/285 (2006.01)

CPC (source: EP KR)

H01J 37/321 (2013.01 - EP); H01J 37/3211 (2013.01 - KR); H01J 37/32504 (2013.01 - EP); H01J 37/32623 (2013.01 - EP); H01J 37/32651 (2013.01 - EP); H01J 37/34 (2013.01 - EP); H01J 37/32137 (2013.01 - KR)

Citation (search report)

See references of WO 9742648A1

Designated contracting state (EPC)

BE CH DE FR GB IE IT LI NL

DOCDB simple family (publication)

WO 9742648 A1 19971113; EP 0845151 A1 19980603; JP 3175835 B2 20010611; JP H10510676 A 19981013; KR 100489917 B1 20050805; KR 19990028803 A 19990415; TW 324831 B 19980111

DOCDB simple family (application)

US 9708008 W 19970508; EP 97925528 A 19970508; JP 54025297 A 19970508; KR 19980700103 A 19980108; TW 86106111 A 19970508