Global Patent Index - EP 0865513 A4

EP 0865513 A4 20010221 - SPUTTERING OF LITHIUM

Title (en)

SPUTTERING OF LITHIUM

Title (de)

SPUTTERN VON LITHIUM

Title (fr)

PULVERISATION DE LITHIUM

Publication

EP 0865513 A4 20010221 (EN)

Application

EP 96943612 A 19961205

Priority

  • US 9619408 W 19961205
  • US 56778195 A 19951205

Abstract (en)

[origin: US6039850A] Lithium is sputtered from a target with a metallic lithium surface using an alternating sputtering potential with a frequency between about 8 and about 120 kHz, preferably about 10-100 kHz or using a DC sputtering potential and a reverse cleaning potential applied intermittently. The process can be used to apply lithium to electrochromic materials such as coatings on window glass.

IPC 1-7

C23C 14/34; C23C 14/35; C23C 14/18

IPC 8 full level

G02F 1/15 (2006.01); C23C 14/18 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01)

CPC (source: EP KR US)

C23C 14/185 (2013.01 - EP KR US); C23C 14/3414 (2013.01 - EP US); C23C 14/3464 (2013.01 - EP US); C23C 14/3485 (2013.01 - KR); C23C 14/352 (2013.01 - EP US); H01J 37/3426 (2013.01 - EP US)

Citation (search report)

  • [A] WO 8912844 A1 19891228 - EIC LAB INC [US]
  • [A] DD 252205 A1 19871209 - ARDENNE FORSCHUNGSINST [DD]
  • [A] FR 2685011 A1 19930618 - ELF AQUITAINE [FR]
  • [YA] PATENT ABSTRACTS OF JAPAN vol. 014, no. 411 (E - 0973) 5 September 1990 (1990-09-05)
  • [YA] PATENT ABSTRACTS OF JAPAN vol. 012, no. 382 (C - 535) 12 October 1988 (1988-10-12)
  • [YA] ANONYMOUS: "ARC Melting Technique For Fabricating Small Sputtering Targets. August 1979.", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 22, no. 3, 1 August 1979 (1979-08-01), New York, US, pages 1228 - 1229, XP002155996

Designated contracting state (EPC)

AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

US 6039850 A 20000321; AT E372399 T1 20070915; AU 1281097 A 19970627; AU 703062 B2 19990311; BR 9611887 A 19990217; CA 2238319 A1 19970612; CA 2238319 C 20010417; DE 69637232 D1 20071018; DE 69637232 T2 20080103; EP 0865513 A1 19980923; EP 0865513 A4 20010221; EP 0865513 B1 20070905; ES 2293652 T3 20080316; JP 2000509100 A 20000718; JP 4059302 B2 20080312; KR 19990071940 A 19990927; US 5830336 A 19981103; WO 9720962 A1 19970612

DOCDB simple family (application)

US 86554497 A 19970529; AT 96943612 T 19961205; AU 1281097 A 19961205; BR 9611887 A 19961205; CA 2238319 A 19961205; DE 69637232 T 19961205; EP 96943612 A 19961205; ES 96943612 T 19961205; JP 52144297 A 19961205; KR 19980704228 A 19980605; US 56778195 A 19951205; US 9619408 W 19961205