Global Patent Index - EP 0869542 A3

EP 0869542 A3 20010328 - Cleaning and drying apparatus, wafer processing system and wafer processing method

Title (en)

Cleaning and drying apparatus, wafer processing system and wafer processing method

Title (de)

Vorrichtung zum Reinigen und Trocknen, Scheibenprozesssystem und Scheibenprozessverfahren

Title (fr)

Dispositif de nettoyage et séchage, système de traitement des plaquettes et méthode de traitement des plaquettes

Publication

EP 0869542 A3 20010328 (EN)

Application

EP 98302356 A 19980327

Priority

  • JP 9980397 A 19970402
  • JP 11878497 A 19970421

Abstract (en)

[origin: EP0869542A2] A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means. <IMAGE>

IPC 1-7

H01L 21/00

IPC 8 full level

H01L 21/00 (2006.01)

CPC (source: EP)

H01L 21/67028 (2013.01); H01L 21/67781 (2013.01); Y10S 134/902 (2013.01)

Citation (search report)

Designated contracting state (EPC)

AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

EP 0869542 A2 19981007; EP 0869542 A3 20010328; EP 0869542 B1 20060315; DE 69833832 D1 20060511; DE 69833832 T2 20060831; DE 69842125 D1 20110317; EP 1635380 A1 20060315; EP 1635380 B1 20110202; KR 100395997 B1 20031201; KR 19980081033 A 19981125; TW 434671 B 20010516; US 6068002 A 20000530; US 6171403 B1 20010109

DOCDB simple family (application)

EP 98302356 A 19980327; DE 69833832 T 19980327; DE 69842125 T 19980327; EP 05077775 A 19980327; KR 19980011635 A 19980402; TW 87104721 A 19980330; US 4656698 A 19980324; US 55256900 A 20000419