EP 0869542 A3 20010328 - Cleaning and drying apparatus, wafer processing system and wafer processing method
Title (en)
Cleaning and drying apparatus, wafer processing system and wafer processing method
Title (de)
Vorrichtung zum Reinigen und Trocknen, Scheibenprozesssystem und Scheibenprozessverfahren
Title (fr)
Dispositif de nettoyage et séchage, système de traitement des plaquettes et méthode de traitement des plaquettes
Publication
Application
Priority
- JP 9980397 A 19970402
- JP 11878497 A 19970421
Abstract (en)
[origin: EP0869542A2] A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means. <IMAGE>
IPC 1-7
IPC 8 full level
H01L 21/00 (2006.01)
CPC (source: EP KR US)
H01L 21/302 (2013.01 - KR); H01L 21/67028 (2013.01 - EP US); H01L 21/67781 (2013.01 - EP US); Y10S 134/902 (2013.01 - EP US)
Citation (search report)
- [A] US 5331987 A 19940726 - HAYASHI EIICHIRO [JP], et al
- [A] US 5369891 A 19941206 - KAMIKAWA YUUJI [JP]
- [EL] EP 0855736 A2 19980729 - TOKYO ELECTRON LTD [JP]
- [A] US 5370142 A 19941206 - NISHI MITSUO [JP], et al
- [A] US 5551459 A 19960903 - OHMORI MASASHI [JP], et al
Designated contracting state (EPC)
AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
EP 0869542 A2 19981007; EP 0869542 A3 20010328; EP 0869542 B1 20060315; DE 69833832 D1 20060511; DE 69833832 T2 20060831; DE 69842125 D1 20110317; EP 1635380 A1 20060315; EP 1635380 B1 20110202; KR 100395997 B1 20031201; KR 19980081033 A 19981125; TW 434671 B 20010516; US 6068002 A 20000530; US 6171403 B1 20010109
DOCDB simple family (application)
EP 98302356 A 19980327; DE 69833832 T 19980327; DE 69842125 T 19980327; EP 05077775 A 19980327; KR 19980011635 A 19980402; TW 87104721 A 19980330; US 4656698 A 19980324; US 55256900 A 20000419