EP 0873435 B1 20000329 - PROCESS FOR MAINTAINING A CONSTANT CONCENTRATION OF SUBSTANCES IN AN ELECTROPLATING BATH
Title (en)
PROCESS FOR MAINTAINING A CONSTANT CONCENTRATION OF SUBSTANCES IN AN ELECTROPLATING BATH
Title (de)
VERFAHREN ZUR AUFRECHTERHALTUNG KONSTANTER KONZENTRATIONEN VON IN EINEM GALVANOTECHNISCHEN BEHANDLUNGSBAD ENTHALTENEN STOFFEN
Title (fr)
PROCEDE DE MAINTIEN DE CONCENTRATIONS CONSTANTES DE SUBSTANCES CONTENUES DANS UN BAIN DE TRAITEMENT GALVANOPLASTIQUE
Publication
Application
Priority
- DE 19600857 A 19960112
- EP 9700097 W 19970110
Abstract (en)
[origin: US6083374A] PCT No. PCT/EP97/00097 Sec. 371 Date Jun. 18, 1998 Sec. 102(e) Date Jun. 18, 1998 PCT Filed Jan. 10, 1997 PCT Pub. No. WO97/25456 PCT Pub. Date Jul. 17, 1997The invention relates to a method for maintaining constant concentrations of substances contained in an electrolytic treatment bath, preferably in baths with aqueous solutions. In order to regenerate the continual depletion of chemicals, substance concentrates are added to the baths according to known methods. The rapid increase in concentrations of damaging substances in the processing solution is disadvantageous. In order to reduce this build-up, a further metering method is known, namely the continuous replacement of bath solution by creating a bath overflow. The addition of bath solution with the bath concentration is balanced out by the overflow. As a consequence of evaporation and entrainment this method also leads to the fact that the operating concentration cannot be maintained for a long period of time in chemically critical baths. With the invention, this problem is resolved by continuous or intermittent removal of bath solution in a defined quantity and addition of fresh bath solution preferably in the same quantity. The changes in the concentrations of substances in the bath occurring through evaporation and entrainment are compensated for completely independently of the metering.
IPC 1-7
IPC 8 full level
C25D 21/14 (2006.01)
CPC (source: EP US)
C25D 21/14 (2013.01 - EP US)
Designated contracting state (EPC)
AT DE ES FR GB IT NL SE
DOCDB simple family (publication)
US 6083374 A 20000704; AT E191243 T1 20000415; DE 19600857 A1 19970717; DE 59701358 D1 20000504; EP 0873435 A1 19981028; EP 0873435 B1 20000329; ES 2144840 T3 20000616; HK 1015421 A1 19991015; JP 2000503071 A 20000314; WO 9725456 A1 19970717
DOCDB simple family (application)
US 9156098 A 19980618; AT 97900996 T 19970110; DE 19600857 A 19960112; DE 59701358 T 19970110; EP 9700097 W 19970110; EP 97900996 A 19970110; ES 97900996 T 19970110; HK 99100252 A 19990119; JP 52486597 A 19970110