EP 0884759 B1 20030305 - Secondary ion mass spectrometer with apertured mask
Title (en)
Secondary ion mass spectrometer with apertured mask
Title (de)
Sekundärionen-Massenspektrometer mit Lochmaske
Title (fr)
Spectromètre de masse à ions secondaires utilisant un masque muni d'une ouverture
Publication
Application
Priority
- DE 19724265 A 19970609
- US 7693698 A 19980513
Abstract (en)
[origin: US6078045A] In a secondary ion mass spectrometry (SIMS) method for analysis of a sample, in a first process step, the kinetic energy of the emitted primary ions emitted by a primary ion source (2) is set to a relatively low value, so that the surface of the sample (1) is enriched with primary ions, and erosion of the surface of the sample (1) essentially does not take place, and in a second process step, the kinetic energy of the primary ions emitted by one and the same primary ion source (2) is set to a relatively high value, so that the surface of the sample (1) can be eroded by the primary ion beam, where the formation of secondary ions in the second process step is promoted by the primary ions implanted during the first process step. Over and above this, targeted, locally differentiated enrichment of the sample surface ("chemical gating") can be carried out.
IPC 1-7
IPC 8 full level
G01N 23/225 (2006.01); G01N 27/62 (2006.01); G01Q 20/02 (2010.01); G01Q 60/44 (2010.01); H01J 37/02 (2006.01); H01J 37/252 (2006.01)
CPC (source: EP US)
G01N 23/2258 (2013.01 - EP US); H01J 37/026 (2013.01 - EP US); H01J 37/252 (2013.01 - EP US); H01J 2237/0042 (2013.01 - EP US); H01J 2237/2527 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
US 6078045 A 20000620; DE 19724265 A1 19981210; EP 0884759 A1 19981216; EP 0884759 B1 20030305; JP 2963439 B2 19991018; JP H1172451 A 19990316; US 6080986 A 20000627
DOCDB simple family (application)
US 7693698 A 19980513; DE 19724265 A 19970609; EP 98110548 A 19980609; JP 16060898 A 19980609; US 9438098 A 19980609