EP 0885079 A4 20021113 - METHOD FOR PRODUCING NEAR NET SHAPE PLANAR SPUTTERING TARGETS AND AN INTERMEDIATE THEREFOR
Title (en)
METHOD FOR PRODUCING NEAR NET SHAPE PLANAR SPUTTERING TARGETS AND AN INTERMEDIATE THEREFOR
Title (de)
VERFAHREN ZUR ERZEUGUNG EINES ENDABMESSUNGSNAHEN PLANAREN SPUTTERTARGETS UND ZWISCHENPRODUKT DAFÜR
Title (fr)
PROCEDE DE PRODUCTION DE SUBSTRATS PLANS DE FORME QUASIMENT NETTE POUR PULVERISATION CATHODIQUE ET INTERMEDIAIRE DESTINE A CE PROCEDE
Publication
Application
Priority
- US 9702060 W 19970213
- US 1294296 P 19960303
Abstract (en)
[origin: WO9731739A1] A preferred method for producing a pair of sputter targets includes the step of machining first and second backing plates to form surfaces having near net profiles characteristic of an ion source, the sputtering material and the target shape. A preform is constructed which includes the first backing plate (34), a first powder layer (36) abutting against the first backing plate, a spacer (38) abutting against the first powder layer, a second powder layer (40) abutting against the spacer, and the second backing plate abutting against the second powder layer. In a preferred form, the spacer comprises a pair of metal plates separated by a layer of bond-resistant material such as boron nitride. The preform is heated and isostatically pressed to consolidate the powder layers to form the pair of sputter targets and to diffusion bond the targets to corresponding backing plates. The method promotes the formation of uniformly even sputtering surfaces on the targets.
IPC 1-7
IPC 8 full level
B22F 7/08 (2006.01); C23C 14/34 (2006.01)
CPC (source: EP KR)
B22F 3/14 (2013.01 - KR); B22F 3/24 (2013.01 - KR); B22F 5/00 (2013.01 - KR); B22F 7/08 (2013.01 - EP); C23C 14/3414 (2013.01 - EP); B22F 2003/1046 (2013.01 - EP); B22F 2998/10 (2013.01 - EP)
Citation (search report)
- [Y] EP 0327871 A2 19890816 - GEN ELECTRIC [US]
- [YD] US 5215639 A 19930601 - BOYS DONALD R [US]
- See references of WO 9731739A1
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 9731739 A1 19970904; EP 0885079 A1 19981223; EP 0885079 A4 20021113; JP 2000506218 A 20000523; KR 19990087413 A 19991227
DOCDB simple family (application)
US 9702060 W 19970213; EP 97906532 A 19970213; JP 53096197 A 19970213; KR 19980706830 A 19980831