Global Patent Index - EP 0887432 A3

EP 0887432 A3 19990120 -

Publication

EP 0887432 A3 19990120

Application

EP 98303270 A 19980428

Priority

GB 9712801 A 19970619

Abstract (en)

[origin: EP0887432A2] An apparatus 1 for the plasma spraying of a substrate 2 comprises a reaction chamber 3 at one end of which is located a plasma torch. A plasma forming gas is delivered under pressure to the torch such that a plasma jet is produced which extends along the length of the reaction chamber 3. An inlet port 8 is provided in the torch for the passage therethrough of a powder material and inlet ports 4 are provided in the reaction chamber 3 for injecting a reactive gas such as methane into the plasma jet. <IMAGE>

IPC 1-7

C23C 4/12

IPC 8 full level

C23C 4/12 (2006.01)

CPC (source: EP)

C23C 4/134 (2016.01)

Citation (search report)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

EP 0887432 A2 19981230; EP 0887432 A3 19990120; CA 2237116 A1 19981219; GB 9712801 D0 19970820

DOCDB simple family (application)

EP 98303270 A 19980428; CA 2237116 A 19980507; GB 9712801 A 19970619