GPI coverage and content

You can use Global Patent Index (GPI) to carry out detailed searches in the EPO's worldwide bibliographic (DOCDB), legal event (INPADOC) and full-text data sets, and download or visualise the search results for statistical analysis.

Current content: 159 515 718 patent documents

This week's update (01/11/2024 12:00 CET):

154 531 new documents added

1 078 520 documents amended

GPI key values

Run regular monitoring (e.g. monthly or quarterly) of technical areas or companies

Use built-in charts to visualise technical trends and patenting activity of companies

Choose the data you want to see and download to focus on what you are interested in

Run data quality assessments to measure the risk of incomplete search results

EP 0887710 A2 19981230 - Resist development process

Title (en)

Resist development process

Title (de)

Resistentwicklungsverfahren

Title (fr)

Procédé de développement de photoréserves

Publication

EP 0887710 A2 19981230 (EN)

Application

EP 98109959 A 19980602

Priority

US 88311697 A 19970626

Abstract (en)

A resist development process includes spinning a resist layer while immersing the resist layer in developer.

IPC 1-7

G03F 7/30

IPC 8 full level

G03F 7/30 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR)

G03F 7/0035 (2013.01 - KR); G03F 7/0045 (2013.01 - KR); G03F 7/11 (2013.01 - KR); G03F 7/30 (2013.01 - KR); G03F 7/3021 (2013.01 - EP); G03F 7/32 (2013.01 - KR)

Designated contracting state (EPC)

DE FR GB IE IT NL

DOCDB simple family (publication)

EP 0887710 A2 19981230; EP 0887710 A3 19990908; EP 0887710 B1 20030219; CN 1213788 A 19990414; DE 69811430 D1 20030327; DE 69811430 T2 20031120; JP H11109648 A 19990423; KR 19990006917 A 19990125

DOCDB simple family (application)

EP 98109959 A 19980602; CN 98108925 A 19980522; DE 69811430 T 19980602; JP 17882198 A 19980625; KR 19980021855 A 19980612