EP 0888570 A1 19990107 - RETICULAR OBJECTIVE FOR MICROLITHOGRAPHY-PROJECTION EXPOSURE INSTALLATIONS
Title (en)
RETICULAR OBJECTIVE FOR MICROLITHOGRAPHY-PROJECTION EXPOSURE INSTALLATIONS
Title (de)
REMA-OBJEKTIV FÜR MIKROLITHOGRAPHIE-PROJEKTIONSBELICHTUNGSANLAGEN
Title (fr)
OBJECTIF A RETICULE POUR UNITES D'EXPOSITION PAR PROJECTION POUR MICROLITHOGRAPHIE
Publication
Application
Priority
- DE 19653983 A 19961221
- EP 9706760 W 19971203
Abstract (en)
[origin: DE19653983A1] A reticular objective is realized by introduction of a few (3-5 units) aspherical lenses (7, 11, 17) of high-quality correction with a low number of lenses (few that 10), and low path in glass (maximum 25-30 % of the object-reticle distance), thus enhancing efficiency.
IPC 1-7
IPC 8 full level
H01L 21/027 (2006.01); G02B 13/14 (2006.01); G02B 13/18 (2006.01); G02B 13/22 (2006.01); G02B 13/24 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP KR US)
G02B 13/143 (2013.01 - EP US); G02B 13/18 (2013.01 - KR); G03F 7/70066 (2013.01 - EP US); G03F 7/70225 (2013.01 - EP US)
Citation (search report)
See references of WO 9828644A1
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
DE 19653983 A1 19980625; EP 0888570 A1 19990107; JP 2000505916 A 20000516; JP 4044146 B2 20080206; KR 100524662 B1 20060112; KR 19990087107 A 19991215; TW 388798 B 20000501; US 6366410 B1 20020402; WO 9828644 A1 19980702
DOCDB simple family (application)
DE 19653983 A 19961221; EP 9706760 W 19971203; EP 97952867 A 19971203; JP 52829398 A 19971203; KR 19980706495 A 19980820; TW 86119289 A 19971219; US 12562199 A 19990812