Global Patent Index - EP 0888579 B1

EP 0888579 B1 20030611 - PROCESS AND ARRANGEMENT FOR OPTIMISING CHARGE PATTERN FORMATION ON A PHOTOCONDUCTOR

Title (en)

PROCESS AND ARRANGEMENT FOR OPTIMISING CHARGE PATTERN FORMATION ON A PHOTOCONDUCTOR

Title (de)

VERFAHREN UND ANORDNUNG ZUM OPTIMIEREN EINER LADUNGSBILDERZEUGUNG AUF EINEM FOTOLEITER

Title (fr)

PROCEDE ET DISPOSITIF POUR OPTIMISER LA PRODUCTION D'UNE IMAGE ELECTRIQUE SUR UN PHOTOCONDUCTEUR

Publication

EP 0888579 B1 20030611 (DE)

Application

EP 97920571 A 19970327

Priority

  • DE 9700663 W 19970327
  • DE 19612637 A 19960329

Abstract (en)

[origin: WO9737285A1] The disclosure relates to a process for optimising charge pattern formation. In order to determine (step 3) an optimised exposure energy (H) for a given charging potential (Vc) of a photoconductor, a sensitivity factor (K) is calculated (step 3). In addition, a process is described whereby an optimised charging potential (Vc) is calculated on the basis of the sensitivity factor (K) for a given exposure energy (H).

IPC 1-7

G03G 15/00; G03G 15/02

IPC 8 full level

G03G 15/00 (2006.01); G03G 15/02 (2006.01)

CPC (source: EP US)

G03G 15/0266 (2013.01 - EP US); G03G 15/5037 (2013.01 - EP US); G03G 15/5045 (2013.01 - EP US); G03G 2215/00084 (2013.01 - EP US)

Designated contracting state (EPC)

BE DE FR GB

DOCDB simple family (publication)

WO 9737285 A1 19971009; DE 59710268 D1 20030717; EP 0888579 A1 19990107; EP 0888579 B1 20030611; US 6167210 A 20001226

DOCDB simple family (application)

DE 9700663 W 19970327; DE 59710268 T 19970327; EP 97920571 A 19970327; US 15545198 A 19980929