EP 0902101 A1 19990317 - Metallic material or film having fluorinated surface layer, and fluorination process
Title (en)
Metallic material or film having fluorinated surface layer, and fluorination process
Title (de)
Metallisches Material oder Film mit fluorierter Oberfläche und Fluorierungsverfahren
Title (fr)
Matériau métallique ou couche mince ayant une surface fluorée et procédé de fluoration
Publication
Application
Priority
JP 24823197 A 19970912
Abstract (en)
The known fluorinated layer has usually a thickness of from 1000 to 3000 angstroms. After the forced oxidation of metal, the forcibly oxidized surface is fluorinated. As a result of the preceding forced oxidation, a 1 mu m or more thick fluorinated layer is formed on the surface of the metal. <IMAGE>
IPC 1-7
IPC 8 full level
C23C 8/08 (2006.01); C23C 8/10 (2006.01); C23C 8/12 (2006.01); C23C 8/16 (2006.01); C23C 8/34 (2006.01); C23C 8/42 (2006.01)
CPC (source: EP KR)
Citation (search report)
- [X] EP 0460701 A1 19911211 - APPLIED MATERIALS INC [US]
- [X] EP 0460700 A1 19911211 - APPLIED MATERIALS INC [US]
- [X] US 4111762 A 19780905 - WADE JACKIE F, et al
- [A] EP 0702098 A1 19960320 - APPLIED MATERIALS INC [US]
- [A] EP 0352061 A2 19900124 - HASHIMOTO CHEMICAL IND [JP]
- [A] PATENT ABSTRACTS OF JAPAN vol. 016, no. 544 (C - 1004) 13 November 1992 (1992-11-13)
- [A] PATENT ABSTRACTS OF JAPAN vol. 018, no. 328 (C - 1215) 22 June 1994 (1994-06-22)
Designated contracting state (EPC)
DE GB
DOCDB simple family (publication)
EP 0902101 A1 19990317; EP 0902101 B1 20030219; DE 69811446 D1 20030327; DE 69811446 T2 20031023; DE 69811446 T4 20040708; JP 3094000 B2 20001003; JP H1192912 A 19990406; KR 100308688 B1 20011130; KR 19990029675 A 19990426; TW 402646 B 20000821
DOCDB simple family (application)
EP 98117280 A 19980911; DE 69811446 A 19980911; DE 69811446 T 19980911; JP 24823197 A 19970912; KR 19980037294 A 19980910; TW 87115090 A 19980910