Global Patent Index - EP 0911690 A1

EP 0911690 A1 19990428 - Photothermographic elements adapted for laser exposure

Title (en)

Photothermographic elements adapted for laser exposure

Title (de)

Für Laserbelichtung adaptierte photothermographische Elemente

Title (fr)

Eléments photothermographiques adaptés pour exposition au laser

Publication

EP 0911690 A1 19990428 (EN)

Application

EP 98117757 A 19980918

Priority

JP 30981197 A 19971024

Abstract (en)

In a photothermographic element adapted for laser exposure, a photosensitive layer and a contiguous non-photosensitive layer have a difference in refractive index from 0.1 to 0.7, and these layers are concurrently coated and dried. The element is not only improved in brittleness, but prevents interference fringes from appearing when the element is subject to laser exposure for forming images.

IPC 1-7

G03C 1/498

IPC 8 full level

G03C 1/498 (2006.01); G03C 1/76 (2006.01); G03C 1/74 (2006.01)

CPC (source: EP)

G03C 1/49872 (2013.01); G03C 1/74 (2013.01)

Citation (search report)

[X] US 4504575 A 19850312 - LEE ROSS A [US]

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

EP 0911690 A1 19990428; JP 3913866 B2 20070509; JP H11133542 A 19990521

DOCDB simple family (application)

EP 98117757 A 19980918; JP 30981197 A 19971024