EP 0914626 A4 20020220 - SEAMLESS, MASKLESS LITHOGRAPHY SYSTEM USING SPATIAL LIGHT MODULATOR
Title (en)
SEAMLESS, MASKLESS LITHOGRAPHY SYSTEM USING SPATIAL LIGHT MODULATOR
Title (de)
RAND- UND MASKENLASER LITHOGRAPHIESYSTEM MIT RÄUMLICHEM LICHTMODULATOR
Title (fr)
SYSTEME LITHOGRAPHIQUE SOUS MASQUE ET SANS DISCONTINUITE COMPRENANT UN MODULATEUR SPATIAL DE LUMIERE
Publication
Application
Priority
US 9612240 W 19960725
Abstract (en)
[origin: WO9804950A1] The invention is a seamless, projection lithography system that eliminates the need for masks through the use of a programmable Spatial Light Modulator (SLM) with high parallel processing power. Illuminating the SLM with a radiation source (1) provides a patterning image of many pixels via a projection system (4) onto a substrate (5). The preferred SLM is a Deformable Micromirror Device (3) for reflective pixel selection using a synchronized pulse laser. An alternative SLM is a Liquid Crystal Light Valve (LCLV) (45) for pass-through pixel selection. Electronic programming enables pixel selection control for error correction of faulty pixel elements. Pixel selection control also provides for negative and positive imaging and for complementary overlapping polygon development for seamless uniform dosage. The invention provides seamless scanning motion by complementary overlap to equalize radiation dosage, to expose a pattern on a large area substrate (5). The invention is suitable for rapid prototyping, flexible manufacturing, and even mask making.
IPC 1-7
IPC 8 full level
G02B 26/08 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP US)
G02B 26/0833 (2013.01 - EP US); G03F 7/70283 (2013.01 - EP); G03F 7/70291 (2013.01 - EP); G03F 7/70358 (2013.01 - EP); G03F 7/70475 (2013.01 - EP); G03F 7/70791 (2013.01 - EP)
Citation (search report)
- [X] WO 9522787 A1 19950824 - LUELLAU FRIEDRICH [DE], et al
- [XA] US 5208818 A 19930504 - GELBART DANIEL [CA], et al
- [X] EP 0528285 A1 19930224 - TEXAS INSTRUMENTS INC [US]
- [DA] US 4924257 A 19900508 - JAIN KANTILAL [US]
- [X] PATENT ABSTRACTS OF JAPAN vol. 014, no. 471 (E - 0990) 15 October 1990 (1990-10-15)
- [X] PATENT ABSTRACTS OF JAPAN vol. 011, no. 195 (E - 518) 23 June 1987 (1987-06-23)
- See references of WO 9804950A1
Designated contracting state (EPC)
CH DE FR GB IT LI NL SE
DOCDB simple family (publication)
WO 9804950 A1 19980205; EP 0914626 A1 19990512; EP 0914626 A4 20020220
DOCDB simple family (application)
US 9612240 W 19960725; EP 96925490 A 19960725