Global Patent Index - EP 0916429 A1

EP 0916429 A1 19990519 - Method and device for forming a side wall on a base plate

Title (en)

Method and device for forming a side wall on a base plate

Title (de)

Verfahren und Vorrichtung zum Formen einer Seitenwand an eine Grundplatte

Title (fr)

Méthode et dispositif pour le formage d'une paroi latérale à une plaque de base

Publication

EP 0916429 A1 19990519 (EN)

Application

EP 98203771 A 19981110

Priority

NL 1007527 A 19971112

Abstract (en)

The invention relates to a method for forming a curved corner wall part (4c) on a baseplate (19), the curved corner wall part (4c) extending along a line of rounding (18) of the baseplate (19) and merging, at each end, into a side wall part (4a, 4b) which is formed on the baseplate (19). The method comprises the following steps: forming at least two side wall parts (4a, 4b) on the baseplate (19) by turning up an edge region of the baseplate (19) through an angle of substantially 90 DEG along a bend line (7a, 7b), which side wall parts (4a, 4b) extend as far as the corner region (5) of the baseplate (19) and merge into one another, in the corner region (5), via a crease-like transition (10) which is directed outwards, deforming the crease-like transition (10) and a part of the corner region (5) which adjoins the crease-like transition (10) to form a conical spout (10a) which extends along the line of rounding (18) of the baseplate (19) and along a section of the bend lines (7a, 7b) which adjoin the line of rounding (18), fitting a die (13) and a blank holder (16), which are substantially shaped so as to correspond to the conical spout (10a), around the conical spout (10a), and deep-drawing the conical spout (10a) so that the curved corner wall part (4c) is formed, the die (13) and the blank holder (16) preventing creases from being formed in the conical spout (10a) during the deep-drawing. <IMAGE>

IPC 1-7

B21D 51/52

IPC 8 full level

B21D 51/52 (2006.01)

CPC (source: EP)

B21D 19/08 (2013.01); B21D 51/52 (2013.01)

Citation (search report)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

EP 0916429 A1 19990519; EP 0916429 B1 20030625; AT E243578 T1 20030715; DE 69815790 D1 20030731; DE 69815790 T2 20040513; DK 0916429 T3 20030929; ES 2202737 T3 20040401; NL 1007527 C2 19990517; PT 916429 E 20031128

DOCDB simple family (application)

EP 98203771 A 19981110; AT 98203771 T 19981110; DE 69815790 T 19981110; DK 98203771 T 19981110; ES 98203771 T 19981110; NL 1007527 A 19971112; PT 98203771 T 19981110