EP 0924487 B1 20010214 - Vacuum drying of semiconductor material
Title (en)
Vacuum drying of semiconductor material
Title (de)
Vakuumtechnisches Trocknen von Halbleiterbruch
Title (fr)
Séchage à vide de matériau semi-conducteur
Publication
Application
Priority
DE 19756830 A 19971219
Abstract (en)
[origin: EP0924487A2] After the final washing stage the silicon grains are placed, in a perforated container, in a heated vacuum tight vessel of VA-2 or VA-4 steel, which is electro-polished or coated with a clean room compatible temperature resistant material, e.g. silicon, Teflon or PFA. A cycle of evacuation and flooding the vessel with extremely pure air with a relative humidity of less than 20% or a pure inert gas is repeated several times.
IPC 1-7
IPC 8 full level
F26B 5/04 (2006.01); H01L 21/304 (2006.01)
CPC (source: EP US)
F26B 5/04 (2013.01 - EP US)
Designated contracting state (EPC)
DE IT
DOCDB simple family (publication)
EP 0924487 A2 19990623; EP 0924487 A3 19990707; EP 0924487 B1 20010214; DE 19756830 A1 19990701; DE 59800476 D1 20010322; JP H11265875 A 19990928; US 6170171 B1 20010109
DOCDB simple family (application)
EP 98124206 A 19981217; DE 19756830 A 19971219; DE 59800476 T 19981217; JP 36098298 A 19981218; US 20749698 A 19981208