Global Patent Index - EP 0942332 A1

EP 0942332 A1 19990915 - Exposure method and apparatus

Title (en)

Exposure method and apparatus

Title (de)

Belichtungsverfahren und -Vorrichtung

Title (fr)

Méthode et dispositif d'exposition

Publication

EP 0942332 A1 19990915 (EN)

Application

EP 99112292 A 19940224

Priority

  • EP 94102817 A 19940224
  • JP 3807793 A 19930226
  • JP 33475993 A 19931228

Abstract (en)

An exposure method and apparatus for exposing, using an exposure apparatus having a mask stage (10,11) for holding a mask (12) having a pattern, a substrate stage (2-4) for holding a substrate (5) to be exposed with said pattern, a projection system (8) for projecting an image of said pattern onto said substrate, and an alignment system having its detection point at a position away from the optical axis of said projection system, said substrate with said pattern through said projection system by moving said mask and said substrate synchronously relative to said projection system in a scanning direction, wherein said method comprises the steps of: obtaining positional relationship between a reference point within an exposing field of said projection system and said detection point of said alignment system; and exposing said substrate based on the obtained positional relationship.

IPC 1-7

G03F 7/20; G03F 9/00

IPC 8 full level

G03F 7/207 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR US)

G03F 7/20 (2013.01 - KR); G03F 7/70358 (2013.01 - EP US); G03F 7/70775 (2013.01 - EP US); G03F 9/7015 (2013.01 - EP US); G03F 9/7088 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

DE GB NL

DOCDB simple family (publication)

EP 0613051 A1 19940831; EP 0613051 B1 20000126; DE 69422739 D1 20000302; DE 69422739 T2 20000615; EP 0942332 A1 19990915; JP 3412704 B2 20030603; JP H07176468 A 19950714; KR 100281211 B1 20010402; KR 100306315 B1 20010924; KR 100397653 B1 20030913; US 5646413 A 19970708; US 5844247 A 19981201; US 6051843 A 20000418; US 6279881 B1 20010828; US 6498352 B1 20021224

DOCDB simple family (application)

EP 94102817 A 19940224; DE 69422739 T 19940224; EP 99112292 A 19940224; JP 33475993 A 19931228; KR 19940003699 A 19940226; KR 19990029135 A 19990719; KR 19990034144 A 19990818; US 18191298 A 19981029; US 51210300 A 20000224; US 60808696 A 19960228; US 83177097 A 19970402; US 90190301 A 20010711