Global Patent Index - EP 0961928 A4

EP 0961928 A4 20000426 - METHOD OF SCANNING SEMICONDUCTOR WAFERS TO INSPECT FOR DEFECTS

Title (en)

METHOD OF SCANNING SEMICONDUCTOR WAFERS TO INSPECT FOR DEFECTS

Title (de)

VERFAHREN ZUM SCANNEN VON HALBLEITERWAFERN ZUR DETEKTION VON DEFEKTEN

Title (fr)

PROCEDE SERVANT A DETECTER DES DEFAUTS PAR BALAYAGE SUR DES TRANCHES A SEMI-CONDUCTEURS

Publication

EP 0961928 A4 20000426 (EN)

Application

EP 98907527 A 19980220

Priority

  • US 9803239 W 19980220
  • US 3901797 P 19970221

Abstract (en)

[origin: WO9837404A1] A patterned semiconductor wafer (60) is centered on a vacuum chuck (20) that is capable of being rapidly rotated about an axis normal to the wafer (60) surface. The vacuum holds the wafer (60) flat to the chuck (20). As the chuck (20) is rotated, the wafer (60) rotates and the surface of the wafer (60) is scanned (10) with an optical head (30). The output is fed through a signal line (47) of the read head (30) and is compared to a reference file in a processor (50) or signal representing what a perfectly pattern wafer should look like. Differences between the reference standard and the patterned wafer (60) indicate flaws in the patterning. In the case of an unpatterned surface such as a wafer, glass substrate for a liquid crystal display, or a magnetic memory, the reference signal is a null signal and any signal from the read head (30) would signify a flaw in the unpatterned surface.

IPC 1-7

G01N 21/00; G01N 21/84; G01N 21/86; G01B 9/08; G01B 11/00; G01N 21/88; H01L 21/66

IPC 8 full level

G01B 11/30 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); H01L 21/66 (2006.01)

CPC (source: EP)

G01N 21/9501 (2013.01); G01N 21/95607 (2013.01)

Citation (search report)

Designated contracting state (EPC)

AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

WO 9837404 A1 19980827; EP 0961928 A1 19991208; EP 0961928 A4 20000426; JP 2001512576 A 20010821

DOCDB simple family (application)

US 9803239 W 19980220; EP 98907527 A 19980220; JP 53687398 A 19980220