Global Patent Index - EP 0965253 B1

EP 0965253 B1 20030611 - METHOD AND DEVICE FOR PRODUCING PLASMA

Title (en)

METHOD AND DEVICE FOR PRODUCING PLASMA

Title (de)

VERFAHREN UND VORRICHTUNG ZUM ERZEUGEN EINES PLASMAS

Title (fr)

PROCEDE ET DISPOSITIF POUR PRODUIRE UN PLASMA

Publication

EP 0965253 B1 20030611 (DE)

Application

EP 98905135 A 19980303

Priority

  • AT 9800048 W 19980303
  • AT 36897 A 19970304

Abstract (en)

[origin: WO9839953A1] The invention relates to a device for producing RF/HF induced low-energy plasma (17), in particular noble gas plasma, comprising a generator and a supply element for the plasma gas. The invention provides for the generator to be coupled in a known manner to two particularly ring- or disk-shaped two parallel, interspaced electrodes (1), each having at least one through-opening, and for at least one isolator (2) to be positioned between said electrodes (1), said isolator having at least one particularly circular through-opening (3) assigned to the through-opening of the electrode, whose through-opening (3) is designed to confine the plasma (17) formed by a plasma gas at a pressure of at least 0.01 bars but preferably between 0.1 and 5 bars. The inside diameter of the through-opening (4) of the electrodes (1) is at least double but especially approximately four to eight times that of the inside diameter of the through-opening (3) in the isolator (2) for confining the plasma (17).

IPC 1-7

H05H 1/30

IPC 8 full level

H05H 1/30 (2006.01); H05H 1/34 (2006.01)

CPC (source: EP US)

H05H 1/30 (2013.01 - EP US); H05H 1/3431 (2021.05 - EP); H05H 1/3478 (2021.05 - EP); H05H 1/3431 (2021.05 - US); H05H 1/3478 (2021.05 - US)

Designated contracting state (EPC)

DE FR GB IT

DOCDB simple family (publication)

WO 9839953 A1 19980911; AT 405472 B 19990825; AT A36897 A 19981215; AU 6080998 A 19980922; AU 743870 B2 20020207; CA 2283410 A1 19980911; CA 2283410 C 20021112; DE 59808697 D1 20030717; EP 0965253 A1 19991222; EP 0965253 B1 20030611; US 6169370 B1 20010102

DOCDB simple family (application)

AT 9800048 W 19980303; AT 36897 A 19970304; AU 6080998 A 19980303; CA 2283410 A 19980303; DE 59808697 T 19980303; EP 98905135 A 19980303; US 38934999 A 19990903