Global Patent Index - EP 0968142 A1

EP 0968142 A1 2000-01-05 - REACTIVE ION ETCHING OF SILICA STRUCTURES

Title (en)

REACTIVE ION ETCHING OF SILICA STRUCTURES

Title (de)

REAKTIVES IONENAETZEN VON SILIZIUMDIOXIDSTRUKTUREN

Title (fr)

GRAVURE DE STRUCTURES DE SILICIUM PAR IONS REACTIFS

Publication

EP 0968142 A1 (EN)

Application

EP 97942702 A

Priority

  • AU 9700663 W
  • AU PO281896 A

Abstract (en)

[origin: WO9815504A1] The invention relates to a method for etching of silica-based layers/substrates by reactive ion etching system (10) using an etching gas mixture of CHF3/AR through a photoresist mask. Reactive ion etching is carried out under conditions of simultaneous isotropic deposition of a carbon-based polymer where the polymer deposition rate is controlled by adjusting process control parameters of RF power, sample temperature, O2 and CF4 additions.

IPC 1-7 (main, further and additional classification)

C03C 15/00; C03C 17/32; C23C 14/04; C23C 14/12; C23C 14/32; C23C 14/54; G02B 6/12; G02B 6/13; G02B 6/136

IPC 8 full level (invention and additional information)

G02B 6/13 (2006.01); C03C 15/00 (2006.01); C23C 16/30 (2006.01); G02B 6/136 (2006.01); H01L 21/302 (2006.01); H01L 21/3065 (2006.01); G02B 6/12 (2006.01)

CPC (invention and additional information)

H01J 37/32082 (2013.01); C03C 15/00 (2013.01); C23C 16/30 (2013.01); G02B 6/136 (2013.01); G02B 2006/12173 (2013.01); G02B 2006/12176 (2013.01); H01J 2237/334 (2013.01)

Designated contracting state (EPC)

DE FR GB IT

EPO simple patent family

WO 9815504 A1 19980416; AU PO281896 D0 19961031; CA 2265617 A1 19980416; EP 0968142 A1 20000105; EP 0968142 A4 20030806; JP 2001501573 A 20010206; KR 20000048865 A 20000725; US 2002104821 A1 20020808

INPADOC legal status


2004-09-15 [18D] DEEMED TO BE WITHDRAWN

- Effective date: 20040309

2003-10-15 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20030828

2003-08-06 [A4] SUPPLEMENTARY SEARCH REPORT

- Effective date: 20030620

2000-01-05 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 19990319

2000-01-05 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A1

- Designated State(s): DE FR GB IT