Global Patent Index - EP 0972431 A2

EP 0972431 A2 2000-01-19 - PARTICLE MANIPULATION

Title (en)

PARTICLE MANIPULATION

Title (de)

TEILCHENMANIPULIERUNG

Title (fr)

MANIPULATION DE PARTICULES

Publication

EP 0972431 A2 (DE)

Application

EP 98919213 A

Priority

  • DE 19713637 A
  • EP 9801938 W

Abstract (en)

[origin: DE19713637A1] The invention relates to a method for manipulating particles which are in a plasma crystalline state in a plasma of a carrier gas. According to the method, the particles are subjected at least partly to a plasma treatment and/or applied to the surface of a substrate. A device for manipulating particles in the plasma crystalline state comprises a reaction vessel in which plasma electrodes and at least one substrate are placed. The invention provides an adaptive electrode for creating a low frequency or static electric field at selected sites in the reaction vessel.

IPC 1-7 (main, further and additional classification)

H05H 3/04

IPC 8 full level (invention and additional information)

H05H 1/46 (2006.01); H05H 3/04 (2006.01)

CPC (invention and additional information)

H05H 3/04 (2013.01); Y10S 977/773 (2013.01); Y10S 977/84 (2013.01)

Citation (search report)

See references of WO 9844766A3

Designated contracting state (EPC)

DE FR GB IT NL

DOCDB simple family

DE 19713637 A1 19981022; DE 19713637 C2 19990218; DE 59813144 D1 20051201; EP 0972431 A2 20000119; EP 0972431 B1 20051026; JP 2001518230 A 20011009; US 6517912 B1 20030211; WO 9844766 A2 19981008; WO 9844766 A3 19990107