EP 0972431 A2 20000119 - PARTICLE MANIPULATION
Title (en)
PARTICLE MANIPULATION
Title (de)
TEILCHENMANIPULIERUNG
Title (fr)
MANIPULATION DE PARTICULES
Publication
Application
Priority
- DE 19713637 A 19970402
- EP 9801938 W 19980402
Abstract (en)
[origin: DE19713637A1] The invention relates to a method for manipulating particles which are in a plasma crystalline state in a plasma of a carrier gas. According to the method, the particles are subjected at least partly to a plasma treatment and/or applied to the surface of a substrate. A device for manipulating particles in the plasma crystalline state comprises a reaction vessel in which plasma electrodes and at least one substrate are placed. The invention provides an adaptive electrode for creating a low frequency or static electric field at selected sites in the reaction vessel.
IPC 1-7
IPC 8 full level
CPC (source: EP US)
H05H 3/04 (2013.01 - EP US); Y10S 977/773 (2013.01 - EP US); Y10S 977/84 (2013.01 - EP US)
Citation (search report)
See references of WO 9844766A2
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
DE 19713637 A1 19981022; DE 19713637 C2 19990218; DE 59813144 D1 20051201; EP 0972431 A2 20000119; EP 0972431 B1 20051026; JP 2001518230 A 20011009; US 6517912 B1 20030211; WO 9844766 A2 19981008; WO 9844766 A3 19990107
DOCDB simple family (application)
DE 19713637 A 19970402; DE 59813144 T 19980402; EP 9801938 W 19980402; EP 98919213 A 19980402; JP 54117798 A 19980402; US 40229599 A 19991129