Global Patent Index - EP 0976153 A1

EP 0976153 A1 2000-02-02 - NANOPOROUS DIELECTRIC FILMS WITH GRADED DENSITY AND PROCESS FOR MAKING SUCH FILMS

Title (en)

NANOPOROUS DIELECTRIC FILMS WITH GRADED DENSITY AND PROCESS FOR MAKING SUCH FILMS

Title (de)

NANOPORÖSE DIELEKTRISCHE SCHICHTEN MIT DICHTGRADIENT UND VERFAHREN ZU IHRE HERSTELLUNG

Title (fr)

PELLICULES DIELECTRIQUES NANOPOREUSES A DENSITE PROGRESSIVE, ET LEUR PROCEDE DE FABRICATION

Publication

EP 0976153 A1 (EN)

Application

EP 98914425 A

Priority

  • US 9806492 W
  • US 4326197 P
  • US 4647498 A

Abstract (en)

[origin: WO9847177A1] The present invention relates to nanoporous dielectric films (10) and to a process for their manufacture. A substrate having a plurality of raised lines (4) on its surface is provided with a relatively high porosity, low dielectric constant, silicon containing polymer composition (10) positioned between the raise lines (4) and a relatively low porosity, high dielectric constant, silicon containing composition (8) positioned on the lines (4).

IPC 1-7 (main, further and additional classification)

H01L 21/768; H01L 23/522; H01L 23/532

IPC 8 full level (invention and additional information)

H01L 21/316 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/532 (2006.01)

CPC (invention and additional information)

H01L 23/5329 (2013.01); H01L 21/02126 (2013.01); H01L 21/02203 (2013.01); H01L 21/02216 (2013.01); H01L 21/02282 (2013.01); H01L 21/02337 (2013.01); H01L 21/02343 (2013.01); H01L 21/31695 (2013.01); H01L 21/7682 (2013.01); H01L 23/5222 (2013.01); H01L 2221/1047 (2013.01); H01L 2924/0002 (2013.01)

Combination set (CPC)

H01L 2924/0002 + H01L 2924/00

Citation (search report)

See references of WO 9847177A1

Designated contracting state (EPC)

DE FR GB IE NL

DOCDB simple family

WO 9847177 A1 19981022; AU 6878598 A 19981111; CN 1260908 A 20000719; EP 0976153 A1 20000202; JP 2001520805 A 20011030; KR 20010006553 A 20010126; TW 367591 B 19990821