EP 0977028 A4 20010523 - METHOD OF SPECTROCHEMICAL ANALYSIS OF IMPURITY IN GAS
Title (en)
METHOD OF SPECTROCHEMICAL ANALYSIS OF IMPURITY IN GAS
Title (de)
VERFAHREN ZUR SPEKTROCHEMISCHEN ANALYSE VON VERUNREINIGUNGEN IN GAS
Title (fr)
PROCEDE D'ANALYSE SPECTRALE D'IMPURETES DANS UN GAZ
Publication
Application
Priority
- JP 9900323 W 19990127
- JP 1620198 A 19980128
Abstract (en)
[origin: WO9939188A1] An absorption spectrochemical analysis using frequency-modulated laser produced by a semiconductor laser device. To measure absorption spectra, the semiconductor laser device is operated by injection current in a range between the lower limit (B) where the change in laser intensity as the increase in injection current becomes close to a minimum and the higher limit (C) where the change in laser wavelength as the increase in injection current becomes close to a minimum. This method allows minute impurity in gas to be measured with high sensitivity and accuracy.
IPC 1-7
IPC 8 full level
G01N 21/39 (2006.01); H01S 5/06 (2006.01)
CPC (source: EP KR)
G01N 21/39 (2013.01 - EP KR); G01N 2021/391 (2013.01 - EP)
Citation (search report)
- [A] EP 0706042 A1 19960410 - NIPPON OXYGEN CO LTD [JP]
- [A] DE 4000583 A1 19910711 - MUETEK GMBH [DE]
- [A] EP 0449573 A2 19911002 - TOKYO GAS CO LTD [JP]
- [A] US 5173749 A 19921222 - TELL ROBERT [SE], et al
- [A] US 5637872 A 19970610 - TULIP JOHN [CA]
- [A] PATENT ABSTRACTS OF JAPAN vol. 007, no. 113 (P - 197) 18 May 1983 (1983-05-18)
- [A] PATENT ABSTRACTS OF JAPAN vol. 1997, no. 04 30 April 1997 (1997-04-30)
- See references of WO 9939188A1
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
WO 9939188 A1 19990805; EP 0977028 A1 20000202; EP 0977028 A4 20010523; JP H11211658 A 19990806; KR 100316487 B1 20011212; KR 20010005783 A 20010115; TW 448291 B 20010801
DOCDB simple family (application)
JP 9900323 W 19990127; EP 99901876 A 19990127; JP 1620198 A 19980128; KR 19997008855 A 19990928; TW 88101203 A 19990127