Global Patent Index - EP 0980741 B1

EP 0980741 B1 2002-11-13 - Method and apparatus for abrasive slurry distribution in mechanical polishing of substrate

Title (en)

Method and apparatus for abrasive slurry distribution in mechanical polishing of substrate

Title (de)

Verfahren und Vorrichtung zur Abgabe von Poliermittel -Aufschlämmung im mechanischen Polieren von Substraten

Title (fr)

Dispositif et procédé de distribution de suspension abrasive pour le polissage mécanique de substrat

Publication

EP 0980741 B1 (FR)

Application

EP 99401715 A

Priority

FR 9810508 A

Abstract (en)

[origin: EP0980741A1] The apparatus for distribution of abrasive suspension or slurry comprises a reservoir (1) in a recirculation contour (40) with pumps (5,6) and a filter (8), and a flow control system including a pressure sensor (80) and a proportional integral-differential (PID) block (81) electrically connected to pumps. The apparatus also includes a refilling reservoir (42), a reservoir (44) for an inert gas under pressure as e.g. nitrogen (N2) of high purity, and valves (70,71,72) in lines to user terminals. The flow velocity in the distribution system is within the limits 0.2-10 m/s, preferably 0.5-2 m/s or 1-1.2 m/s. The two pumps (5,6) are connected in parallel, each operating at 50 % of power with possibility of 100 % in the case of breakdown of one pump. The distribution system also contains the means for vaporization of deionized water in gas under pressure to prevent blockage of filters. In another embodiment, the apparatus comprises two reservoirs for abrasive suspension connected in parallel, and a control system with the pressure sensor, the PID block, and additional controlled valves and level sensors.

IPC 1-7 (main, further and additional classification)

B24B 37/04; B24B 57/02

IPC 8 full level (invention and additional information)

B24B 57/00 (2006.01); B24B 37/04 (2012.01); B24B 57/02 (2006.01)

CPC (invention and additional information)

B24B 57/02 (2013.01); B24B 37/04 (2013.01); Y10T 137/4673 (2015.04); Y10T 137/469 (2015.04); Y10T 137/4807 (2015.04)

Designated contracting state (EPC)

DE GB IT NL

EPO simple patent family

EP 0980741 A1 20000223; EP 0980741 B1 20021113; CN 1139106 C 20040218; CN 1247381 A 20000315; DE 69903893 D1 20021219; DE 69903893 T2 20031009; FR 2782506 A1 20000225; FR 2782506 B1 20000922; JP 2000071173 A 20000307; JP 4970635 B2 20120711; KR 100601812 B1 20060719; KR 20000017362 A 20000325; SG 75972 A1 20001024; TW 411289 B 20001111; US 6125876 A 20001003

INPADOC legal status


2011-07-29 [PG25 GB] LAPSED IN A CONTRACTING STATE ANNOUNCED VIA POSTGRANT INFORM. FROM NAT. OFFICE TO EPO

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