Global Patent Index - EP 0986939 A1

EP 0986939 A1 20000322 - PLASMA PROCESSING DEVICE FOR SURFACES

Title (en)

PLASMA PROCESSING DEVICE FOR SURFACES

Title (de)

VORRICHTUNG ZUR PLASMABEHANDLUNG VON OBERFLÄCHEN

Title (fr)

DISPOSITIF DE TRAITEMENT DE SURFACES AU PLASMA

Publication

EP 0986939 A1 20000322 (DE)

Application

EP 99919177 A 19990401

Priority

  • DE 29805999 U 19980403
  • EP 9902256 W 19990401

Abstract (en)

[origin: US6265690B1] A mechanism for plasma surface treatment includes a rotating head having at least one eccentrically disposed plasma nozzle for generating a plasma jet directed in parallel with the axis of rotation. The nozzle includes a swirl system for swirling the plasma jet.

IPC 1-7

H05H 1/34; H05H 1/44; B05D 3/14; B29C 59/14

IPC 8 full level

H05H 1/24 (2006.01); B05D 3/14 (2006.01); B29C 59/14 (2006.01); C08J 7/00 (2006.01); H05H 1/34 (2006.01); H05H 1/44 (2006.01)

CPC (source: EP US)

B05D 3/144 (2013.01 - EP US); B29C 59/14 (2013.01 - EP US); H05H 1/44 (2013.01 - EP US)

Designated contracting state (EPC)

AT BE CH DE DK ES FR GB IE IT LI

DOCDB simple family (publication)

US 6265690 B1 20010724; AT E270028 T1 20040715; DE 29805999 U1 19980625; DE 59909795 D1 20040729; EP 0986939 A1 20000322; EP 0986939 B1 20040623; ES 2224644 T3 20050301; JP 2002500818 A 20020108; JP 4255518 B2 20090415; WO 9952333 A1 19991014

DOCDB simple family (application)

US 44501600 A 20000420; AT 99919177 T 19990401; DE 29805999 U 19980403; DE 59909795 T 19990401; EP 9902256 W 19990401; EP 99919177 A 19990401; ES 99919177 T 19990401; JP 55004299 A 19990401