EP 1004136 A1 20000531 - PLASMA PROCESSING APPARATUS
Title (en)
PLASMA PROCESSING APPARATUS
Title (de)
PLASMA-BEHANDLUNGSVORRICHTUNG
Title (fr)
APPAREIL DE TRAITEMENT PAR PLASMA
Publication
Application
Priority
- GB 9901913 W 19990616
- GB 9812852 A 19980616
Abstract (en)
[origin: WO9966531A1] There is disclosed a plasma processing apparatus comprising: a) a chamber having a plasma containing region, the chamber having a dielectric portion; b) an antenna (6) for coupling radio frequency (RF) power into the plasma; and c) a shield member (2) which reduces the level of RF power capacitively coupled into the plasma, wherein the shield member (2) comprises a conducting portion and is positioned between the plasma and the dielectric portion. Also disclosed is a shield member, particularly one for use in the described plasma processing apparatus.
IPC 1-7
IPC 8 full level
B01J 19/08 (2006.01); C23C 14/34 (2006.01); C23F 4/00 (2006.01); H01J 37/32 (2006.01); H01L 21/205 (2006.01); H01L 21/302 (2006.01); H01L 21/3065 (2006.01); H05H 1/46 (2006.01)
CPC (source: EP KR)
H01J 37/32 (2013.01 - KR); H01J 37/321 (2013.01 - EP); H01J 37/32504 (2013.01 - EP); H01J 37/32623 (2013.01 - EP)
Citation (search report)
See references of WO 9966531A1
Designated contracting state (EPC)
AT BE CH DE DK ES FI FR GB IE IT LI NL SE
DOCDB simple family (publication)
WO 9966531 A1 19991223; EP 1004136 A1 20000531; GB 9812852 D0 19980812; JP 2002518165 A 20020625; KR 20010022962 A 20010326
DOCDB simple family (application)
GB 9901913 W 19990616; EP 99926627 A 19990616; GB 9812852 A 19980616; JP 2000555274 A 19990616; KR 20007001570 A 20000216