Global Patent Index - EP 1011919 A4

EP 1011919 A4 20001102 - IMPROVED POLISHING PADS AND METHODS RELATING THERETO

Title (en)

IMPROVED POLISHING PADS AND METHODS RELATING THERETO

Title (de)

VERBESSERTE POLIERKISSEN UND DARAUF BEZOGENE VERFAHREN

Title (fr)

TAMPONS DE POLISSAGE PERFECTIONNES ET PROCEDES ASSOCIES

Publication

EP 1011919 A4 20001102 (EN)

Application

EP 98938386 A 19980805

Priority

  • US 9816289 W 19980805
  • US 5490697 P 19970806

Abstract (en)

[origin: WO9907515A1] Polishing pads are provided having a polishing surface formed from a hydrophilic material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.

IPC 1-7

B24B 1/00; B24B 7/19; B24B 7/30

IPC 8 full level

B24B 37/00 (2006.01); B24B 37/04 (2006.01); B24B 37/24 (2012.01); B24D 3/26 (2006.01); B24D 13/12 (2006.01); B24D 13/14 (2006.01); H01L 21/304 (2006.01)

CPC (source: EP KR)

B24B 37/24 (2013.01 - EP KR); B24B 37/26 (2013.01 - KR); B24D 3/26 (2013.01 - EP); B24D 3/28 (2013.01 - KR)

Citation (search report)

Designated contracting state (EPC)

DE FR GB IT

DOCDB simple family (publication)

WO 9907515 A1 19990218; CN 1265618 A 20000906; DE 69827147 D1 20041125; DE 69827147 T2 20060302; EP 1011919 A1 20000628; EP 1011919 A4 20001102; EP 1011919 B1 20041020; JP 2001513450 A 20010904; KR 100499601 B1 20050707; KR 20010022571 A 20010326

DOCDB simple family (application)

US 9816289 W 19980805; CN 98807897 A 19980805; DE 69827147 T 19980805; EP 98938386 A 19980805; JP 2000507086 A 19980805; KR 20007001162 A 20000203