Global Patent Index - EP 1014198 A2

EP 1014198 A2 20000628 - Projection lithography using a servo control

Title (en)

Projection lithography using a servo control

Title (de)

Projektionslithographie unter Verwendung einer Servosteuerung

Title (fr)

Lithographie par projection utilisant une servo-commande

Publication

EP 1014198 A2 20000628 (EN)

Application

EP 99310126 A 19991215

Priority

  • EP 99310126 A 19991215
  • EP 98204308 A 19981217

Abstract (en)

In a photolithography apparatus, accelerations of the lens unit due to vibrational disturbances are measured and used to derive a control signal which is applied to the positioning means of the wafer table and/or mask table, so as to effect compensating motions of that table. This feedforward system can be optimized to correct for motions of the lens unit in specific frequency bands, e.g. in the vicinity of the eigenfrequency of the lens. <IMAGE>

IPC 1-7

G03F 7/20

IPC 8 full level

G03F 7/20 (2006.01)

CPC (source: EP)

G03F 7/70725 (2013.01); G03F 7/709 (2013.01)

Designated contracting state (EPC)

DE FR GB IT NL

DOCDB simple family (publication)

EP 1014198 A2 20000628; EP 1014198 A3 20021016

DOCDB simple family (application)

EP 99310126 A 19991215