EP 1014198 A2 20000628 - Projection lithography using a servo control
Title (en)
Projection lithography using a servo control
Title (de)
Projektionslithographie unter Verwendung einer Servosteuerung
Title (fr)
Lithographie par projection utilisant une servo-commande
Publication
Application
Priority
- EP 99310126 A 19991215
- EP 98204308 A 19981217
Abstract (en)
In a photolithography apparatus, accelerations of the lens unit due to vibrational disturbances are measured and used to derive a control signal which is applied to the positioning means of the wafer table and/or mask table, so as to effect compensating motions of that table. This feedforward system can be optimized to correct for motions of the lens unit in specific frequency bands, e.g. in the vicinity of the eigenfrequency of the lens. <IMAGE>
IPC 1-7
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP)
G03F 7/70725 (2013.01); G03F 7/709 (2013.01)
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
DOCDB simple family (application)
EP 99310126 A 19991215