Global Patent Index - EP 1016130 A1

EP 1016130 A1 2000-07-05 - METAL AND METAL SILICIDE NITRIDIZATION IN A HIGH DENSITY, LOW PRESSURE PLASMA REACTOR

Title (en)

METAL AND METAL SILICIDE NITRIDIZATION IN A HIGH DENSITY, LOW PRESSURE PLASMA REACTOR

Title (de)

METALL UND METALLSILIZID-NITRIDIERUNG IN EINEM PLASMAAPPARAT MIT HOHER DICHTE UND NIEDRIGEM DRUCK

Title (fr)

NITRURATION DE METAL ET DE SILICIURE DE METAL DANS UN REACTEUR A PLASMA BASSE PRESSION, HAUTE DENSITE

Publication

EP 1016130 A1 (EN)

Application

EP 98931457 A

Priority

  • US 9812934 W
  • US 88171097 A

Abstract (en)

[origin: WO9859366A1] A nitridization process to form a barrier layer on a substrate is described. The nitridization process includes depositing a layer of metal or metal silicide on a surface of the substrate, placing the substrate into a high density, low pressure plasma reactor, introducing into the high density, low pressure plasma reactor a gas including nitrogen, and striking a plasma in the high density, low pressure plasma reactor under conditions that promote nitridization of at least a portion of the layer of metal or metal silicide to produce a composition of metal nitride or metal silicon nitride, respectively.

IPC 1-7 (main, further and additional classification)

H01L 21/285; H01L 21/768

IPC 8 full level (invention and additional information)

C23C 16/56 (2006.01); H01L 21/28 (2006.01); H01L 21/768 (2006.01)

CPC (invention and additional information)

H01L 21/76856 (2013.01); H01L 21/76843 (2013.01)

Citation (search report)

See references of WO 9859366A1

Designated contracting state (EPC)

AT DE FR IE IT NL

EPO simple patent family

WO 9859366 A1 19981230; EP 1016130 A1 20000705; JP 2002506568 A 20020226; KR 20010013723 A 20010226; TW 490509 B 20020611; US 2001002326 A1 20010531; US 6221792 B1 20010424

INPADOC legal status


2002-08-07 [18W] WITHDRAWN

- Date of withdrawal: 20020612

2002-02-27 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20020111

2000-07-05 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20000111

2000-07-05 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A1

- Designated State(s): AT DE FR IE IT NL