Global Patent Index - EP 1021265 A4

EP 1021265 A4 20030827 - INTERMETALLIC ALUMINIDES AND SILICIDES SPUTTERING TARGETS, AND METHODS OF MAKING SAME

Title (en)

INTERMETALLIC ALUMINIDES AND SILICIDES SPUTTERING TARGETS, AND METHODS OF MAKING SAME

Title (de)

SPUTTERING TARGETS AUS INTERMETALLISCHEN ALUMINIDEN UND SILIZIDEN, SOWIE HERSTELLUNGSVERFAHREN DAFÜR

Title (fr)

CIBLES DE PULVERISATION CATHODIQUE D'ALUMINURES ET DE SILICIURES INTERMETALLIQUES, ET LEURS PROCEDES DE FABRICATION

Publication

EP 1021265 A4 20030827 (EN)

Application

EP 98933058 A 19980701

Priority

  • US 9813719 W 19980701
  • US 5226297 P 19970711

Abstract (en)

[origin: WO9902288A1] Described is an in situ method for producing articles of metal aluminide or silicide by reactive sintering and vacuum hot pressing powders and products, such as sputtering targets, produced.

IPC 1-7

B22F 3/14; C23C 14/34; C22C 1/04

IPC 8 full level

C22C 29/04 (2006.01); C23C 14/34 (2006.01)

CPC (source: EP)

C22C 29/04 (2013.01); C23C 14/3414 (2013.01); B22F 2999/00 (2013.01)

Citation (search report)

  • [X] US 5618397 A 19970408 - KANO OSAMU [JP], et al
  • [X] US 4663120 A 19870505 - PARENT EDWARD D [US], et al
  • [X] PATENT ABSTRACTS OF JAPAN vol. 013, no. 388 (C - 630) 28 August 1989 (1989-08-28)
  • [X] PATENT ABSTRACTS OF JAPAN vol. 013, no. 592 (C - 671) 26 December 1989 (1989-12-26)
  • See references of WO 9902288A1

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

WO 9902288 A1 19990121; EP 1021265 A1 20000726; EP 1021265 A4 20030827; TW 398020 B 20000711

DOCDB simple family (application)

US 9813719 W 19980701; EP 98933058 A 19980701; TW 87111029 A 19980708