EP 1021825 A1 20000726 - METHOD FOR MECHANOCHEMICAL POST-POLISH CLEANING OF AN OXIDE OR NITRIDE LAYER DEPOSITED ON A SUBSTRATE
Title (en)
METHOD FOR MECHANOCHEMICAL POST-POLISH CLEANING OF AN OXIDE OR NITRIDE LAYER DEPOSITED ON A SUBSTRATE
Title (de)
VERFAHREN ZUR REINIGUNG EINER OXYD- ODER NITRIDSCHICHT AUF EINEM SUBSTRAT NACH EINEM CHEMISCH-MECHANISCHEN POLIEREN
Title (fr)
PROCEDE DE NETTOYAGE POST-POLISSAGE MECANO-CHIMIQUE D'UNE COUCHE D'OXYDE OU DE NITRURE DEPOSEE SUR UN SUBSTRAT
Publication
Application
Priority
- FR 9802125 W 19981006
- FR 9712436 A 19971006
Abstract (en)
[origin: FR2769248A1] An oxide or nitride layer is subjected to post chemical-mechanical polishing (CMP) cleaning by spraying with an aqueous ammonia and hydrogen peroxide solution and then an aqueous hydrofluoric and hydrochloric acid solution to produce a low etched thickness. A post-CMP cleaning process for an oxide or nitride layer on a substrate comprising spraying the layer with an aqueous solution of ammonia and hydrogen peroxide (NH4OH : H2O2 : H2O) and then with an aqueous solution of hydrofluoric and hydrochloric acids (HF : HCl : H2O) to produce a total etched layer thickness of 4-6 nm.
IPC 1-7
IPC 8 full level
H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/3105 (2006.01)
CPC (source: EP)
H01L 21/02052 (2013.01); H01L 21/31053 (2013.01)
Citation (search report)
See references of WO 9918605A1
Designated contracting state (EPC)
DE FR GB IT
DOCDB simple family (publication)
FR 2769248 A1 19990409; FR 2769248 B1 20000128; EP 1021825 A1 20000726; JP 2001519599 A 20011023; WO 9918605 A1 19990415
DOCDB simple family (application)
FR 9712436 A 19971006; EP 98947604 A 19981006; FR 9802125 W 19981006; JP 2000515291 A 19981006