Global patent index - EP 1025308 A1

EP 1025308 A1 2000-08-09 - PAPER COMPRISING AN EMBOSSED PATTERN, METHOD FOR PRODUCING AND CLOTH FOR MAKING SAME

Title (en)

PAPER COMPRISING AN EMBOSSED PATTERN, METHOD FOR PRODUCING AND CLOTH FOR MAKING SAME

Title (de)

PAPIER MIT RELIEFGEMUSTERTER OBERFLÄCHE, SOWIE VERFAHREN UND GEWEBE ZU DESSEN HERSTELLUNG

Title (fr)

PAPIER COMPORTANT UN MOTIF EN RELIEF, SON PROCEDE DE FABRICATION ET TOILE POUR SA FABRICATION

Publication

EP 1025308 A1 (FR)

Application

EP 98950166 A

Priority

  • FR 9802248 W
  • FR 9713114 A

Abstract (en)

[origin: FR2769927A1] The paper material carries a relief pattern (23) on at least one surface. The pattern (23) is formed by the combination of at least one base (24) and at least one encrusted zone (25), both with differently oriented lines and shapes. The base has dots or dashes in an initial series of parallel rows, and a second series of parallel rows aligned at an angle to the first series. In the encrusted zone, the dashes in one set of parallel rows are at an angle to the dashes in the other set of rows. The paper material has a weight of \-100 g/m<2> and preferably \-160 g/m<2>. In an Independent claim the paper is produced on a rotary press, where the relief pattern is printed on a material directly at the circular form, or it replaces a press blanket. Preferred Features: The material is a woven damask, with the relief pattern, with wefts in different orientations and shapes. The fabric is woven in a single operation, to give the pattern structure. The fabric can have the wefts on a particular alignment, with one or more cut zones to take proud zones with a different weft orientation which are bonded in place by stitching, adhesive, or welding at the periphery. The material can be of metal or plastics materials. The paper can also be printed on a rotary or flatbed press, using a screw plate across the machine width. The pattern can also be printed by a graining roller, using a traditional grained paper.

IPC 1-7 (main, further and additional classification)

D21F 11/00

IPC 8 full level (invention and additional information)

D21F 1/44 (2006.01); D21F 1/46 (2006.01); D21F 11/00 (2006.01)

CPC (invention and additional information)

D21F 1/46 (2013.01); D21F 1/44 (2013.01); D21F 11/006 (2013.01)

Citation (search report)

See references of WO 9920835A1

Designated contracting state (EPC)

AT CH DE DK ES FI GB IT LI LU NL PT SE

EPO simple patent family

FR 2769927 A1 19990423; FR 2769927 B1 19991224; AT 241036 T 20030615; DE 69814897 D1 20030626; EP 1025308 A1 20000809; EP 1025308 B1 20030521; JP 2001521068 A 20011106; US 6773548 B1 20040810; WO 9920835 A1 19990429

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