Global Patent Index - EP 1025462 B1

EP 1025462 B1 20020911 - THERMOSETTING POLYESTER ANTI-REFLECTIVE COATINGS FOR MULTILAYER PHOTORESIST PROCESSES

Title (en)

THERMOSETTING POLYESTER ANTI-REFLECTIVE COATINGS FOR MULTILAYER PHOTORESIST PROCESSES

Title (de)

THERMISCH AUSHÄRTBARE POLYESTER-ANTIREFLEXIONSSCHICHTEN FÜR MEHRLAGENRESISTVERFAHREN

Title (fr)

REVETEMENTS ANTIREFLET DE POLYESTER TERMODURCISSABLE POUR DES PROCEDES DE PHOTORESIST A MULTIPLES COUCHES

Publication

EP 1025462 B1 20020911 (EN)

Application

EP 98952384 A 19981020

Priority

  • US 9822143 W 19981020
  • US 95442597 A 19971020

Abstract (en)

[origin: US6042990A] Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (-CH2-) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.

IPC 1-7

G03C 1/492; G03F 7/038; G03F 7/09

IPC 8 full level

G03F 7/11 (2006.01); C08G 63/54 (2006.01); C09D 167/00 (2006.01); G03F 7/09 (2006.01)

CPC (source: EP KR US)

C09D 167/00 (2013.01 - EP KR US); G03F 7/091 (2013.01 - EP KR US); G03F 7/11 (2013.01 - KR); Y10S 430/109 (2013.01 - EP US)

C-Set (source: EP US)

C09D 167/00 + C08L 61/20

Designated contracting state (EPC)

DE FR GB NL

DOCDB simple family (publication)

US 6042990 A 20000328; CA 2305461 A1 19990429; CN 1276883 A 20001213; DE 69807913 D1 20021017; DE 69807913 T2 20030130; EP 1025462 A1 20000809; EP 1025462 A4 20010117; EP 1025462 B1 20020911; JP 2001521187 A 20011106; JP 2009048210 A 20090305; JP 4374483 B2 20091202; JP 4374502 B2 20091202; KR 20010031185 A 20010416; TW 446738 B 20010721; US 5935760 A 19990810; US 6080530 A 20000627; WO 9921058 A1 19990429

DOCDB simple family (application)

US 32831699 A 19990608; CA 2305461 A 19981020; CN 98810404 A 19981020; DE 69807913 T 19981020; EP 98952384 A 19981020; JP 2000517316 A 19981020; JP 2008293674 A 20081117; KR 20007004121 A 20000417; TW 87117300 A 19981020; US 32830599 A 19990608; US 95442597 A 19971020; US 9822143 W 19981020