EP 1027576 A1 20000816 - METHOD AND APPARATUS FOR MODELING SUBSTRATE REFLECTIVITY DURING CHEMICAL MECHANICAL POLISHING
Title (en)
METHOD AND APPARATUS FOR MODELING SUBSTRATE REFLECTIVITY DURING CHEMICAL MECHANICAL POLISHING
Title (de)
VERFAHREN UND VORRICHTUNG ZUR MODELLIERUNG DER SUBSTRATREFLEKTIVITÄT WÄHREND DES CHEMISCH-MECHANISCHEN POLIERENS
Title (fr)
PROCEDE ET APPAREIL DE MODELISATION DE LA REFLECTIVITE DU SUBSTRAT LORS D'UNE OPERATION DE POLISSAGE CHIMICO-MECANIQUE
Publication
Application
Priority
- US 9816902 W 19980814
- US 96208597 A 19971031
Abstract (en)
[origin: WO9923449A1] A predicted in-situ reflectivity measurement (ISRM) trace is calculated for a substrate undergoing a chemical mechanical polishing. This predicted ISRM trace is an estimate of the measured reflectivity of the substrate as a function of time. During polishing, a laser interferometric detector is used to measure the reflectivity of the substrate and generate a measured ISRM trace. The measured trace is compared to the predicted trace, and the polishing process may be adjusted based on the comparison. For example, the predicted ISRM trace may be used to detect the polishing endpoint.
IPC 1-7
IPC 8 full level
G01N 21/47 (2006.01); B24B 37/013 (2012.01); B24B 49/12 (2006.01); B24B 51/00 (2006.01); G01B 11/06 (2006.01); H01L 21/304 (2006.01); H01L 21/66 (2006.01)
CPC (source: EP)
B24B 37/013 (2013.01); B24B 49/12 (2013.01); B24B 51/00 (2013.01); G01B 11/0683 (2013.01); H01L 22/26 (2013.01)
Citation (search report)
See references of WO 9923449A1
Designated contracting state (EPC)
DE GB
DOCDB simple family (publication)
WO 9923449 A1 19990514; EP 1027576 A1 20000816; JP 2001522139 A 20011113; TW 374050 B 19991111
DOCDB simple family (application)
US 9816902 W 19980814; EP 98939950 A 19980814; JP 2000519266 A 19980814; TW 87112772 A 19980803