EP 1032723 A1 20000906 - METHOD AND APPARATUS FOR MISTED DEPOSITION OF THIN FILMS
Title (en)
METHOD AND APPARATUS FOR MISTED DEPOSITION OF THIN FILMS
Title (de)
VERFAHREN UND VORRICHTUNG ZUR ERZEUGUNG VON DÜNNSCHICHEN MITTELS NEBEL
Title (fr)
PROCEDE ET DISPOSITIF DE DEPOT EN BROUILLARD DE COUCHES MINCES
Publication
Application
Priority
- US 9823753 W 19981109
- US 97179997 A 19971117
Abstract (en)
[origin: WO9925895A1] A liquid mass flow controller (15) controls the delivery of a precursor to a mist generator (12), which produces a charged mist. The mist passes into a velocity reduction chamber (636), and then flows into a deposition chamber (632) through inlet ports (688) in a mist inlet plate (682) that is both a partition between the chambers and a grounded upper electrode. The inlet plate (682) is located above and substantially parallel to the plane of the substrate (600) on which the mist is to be deposited. The substrate (600) is positively charged to accelerate the mist. There are 68.2 inlet ports per cm<2> in an inlet port area (687) of 252 cm<2> of the mist inlet plate (682) directly above the substrate (600). The inlet port area (687) is approximately equal to a substrate deposition area (601). An exhaust port (642) defines a channel about periphery of an exhaust plane parallel to and below the substrate plane.
IPC 1-7
IPC 8 full level
C23C 16/40 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01); H01L 21/31 (2006.01); H01L 21/316 (2006.01); C23C 16/44 (2006.01); H01L 21/314 (2006.01)
CPC (source: EP KR US)
C23C 16/40 (2013.01 - EP); C23C 16/448 (2013.01 - EP); C23C 16/4486 (2013.01 - KR); C23C 16/45565 (2013.01 - EP KR); H01L 21/02197 (2013.01 - EP); H01L 21/02271 (2013.01 - KR); H01L 21/02282 (2013.01 - EP); H01L 28/40 (2013.01 - EP US); Y10S 261/65 (2013.01 - KR)
Citation (search report)
See references of WO 9925895A1
Designated contracting state (EPC)
BE DE FR GB IT NL
DOCDB simple family (publication)
WO 9925895 A1 19990527; EP 1032723 A1 20000906; JP 2001523889 A 20011127; KR 20010032205 A 20010416
DOCDB simple family (application)
US 9823753 W 19981109; EP 98957677 A 19981109; JP 2000521254 A 19981109; KR 20007005395 A 20000517