EP 1032945 A1 20000906 - METHOD AND APPARATUS FOR REDUCING THERMAL GRADIENTS WITHIN A CERAMIC WAFER SUPPORT PEDESTAL
Title (en)
METHOD AND APPARATUS FOR REDUCING THERMAL GRADIENTS WITHIN A CERAMIC WAFER SUPPORT PEDESTAL
Title (de)
VERFAHREN UND VORRICHTUNG ZUR VERMINDERUNG DER THERMISCHEN GRADIENTEN IN EINER KERAMISCHEN WAFERHALTEEINRICHTUNG
Title (fr)
PROCEDE ET DISPOSITIF PERMETTANT DE REDUIRE LES GRADIENTS DE TEMPERATURE DANS UN SOCLE DE SUPPORT DE TRANCHE EN CERAMIQUE
Publication
Application
Priority
- US 9821581 W 19981013
- US 96536997 A 19971106
Abstract (en)
[origin: WO9925005A1] A method and apparatus for reducing the thermal gradients within a ceramic wafer support pedestal. Specifically, the present invention is a heater controller that limits the amount of power that is applied to a resistive heater embedded within a ceramic pedestal. In a first embodiment of the invention limits the current that is delivered to the heater. In a second embodiment of the invention, the power applied to the heater coil is clamped to a maximum level.
IPC 1-7
IPC 8 full level
H01L 21/00 (2006.01); H01L 21/683 (2006.01); H05B 3/00 (2006.01)
CPC (source: EP KR)
H01L 21/00 (2013.01 - KR); H01L 21/67103 (2013.01 - EP)
Citation (search report)
See references of WO 9925005A1
Designated contracting state (EPC)
BE DE FR GB NL
DOCDB simple family (publication)
WO 9925005 A1 19990520; EP 1032945 A1 20000906; JP 2001523041 A 20011120; KR 20010031823 A 20010416; TW 493215 B 20020701
DOCDB simple family (application)
US 9821581 W 19981013; EP 98953443 A 19981013; JP 2000519909 A 19981013; KR 20007004893 A 20000504; TW 87116922 A 19981012