Global Patent Index - EP 1033420 B1

EP 1033420 B1 20040128 - Process and apparatus for electrochemically graining a support for light-sensitive layers

Title (en)

Process and apparatus for electrochemically graining a support for light-sensitive layers

Title (de)

Verfahren und Vorrichtung zum elektrochemischen Aufrauhen eines Trägers für lichtempfindliche Schichten

Title (fr)

Procédé et dispositif de grainage électrochimique de supports de couches sensibles à la lumière

Publication

EP 1033420 B1 20040128 (DE)

Application

EP 00104028 A 20000226

Priority

DE 19908884 A 19990302

Abstract (en)

[origin: EP1033420A1] Process for the electrochemical roughening of a support (2) for light-sensitive layers comprises continuously feeding the support through the electrolytic bath (1). In the roughening zone at the inlet site of the support, the current density in the bath between a first alternating or rotary current electrode and the support is lower than a maximum current density for the roughening. The current density increases to a maximum with increasing removal from the inlet site within the region of the first alternating or rotary current electrode. An Independent claim is also included for an apparatus for the electrochemical roughening of a support (2) comprising an alternating or rotary current electrode arranged in the electrolytic bath and rounded so that its distance (d1) to a support transported through the electrolytic bath is larger on an inlet side (B) in a roughening zone of the bath than within the roughening zone. The distance of the alternating or rotary current electrode to the support is constant from a prescribed removal of the inlet side (B).

IPC 1-7

C25F 3/04; C25F 7/00; B41N 3/03

IPC 8 full level

B41N 3/03 (2006.01); C25F 3/04 (2006.01); C25F 3/16 (2006.01); C25F 3/20 (2006.01); C25F 7/00 (2006.01); G03F 7/09 (2006.01)

CPC (source: EP US)

B41N 3/034 (2013.01 - EP US); C25F 3/04 (2013.01 - EP US); C25F 7/00 (2013.01 - EP US)

Designated contracting state (EPC)

BE FR GB

DOCDB simple family (publication)

EP 1033420 A1 20000906; EP 1033420 B1 20040128; DE 19908884 C1 20001005; JP 2000303200 A 20001031; US 6423206 B1 20020723

DOCDB simple family (application)

EP 00104028 A 20000226; DE 19908884 A 19990302; JP 2000057452 A 20000302; US 51680500 A 20000301