Global Patent Index - EP 1036205 B1

EP 1036205 B1 20020925 - METHOD AND OXYGEN LANCE FOR INJECTING GASES INTO A METALLURGICAL TANK

Title (en)

METHOD AND OXYGEN LANCE FOR INJECTING GASES INTO A METALLURGICAL TANK

Title (de)

VERFAHREN UND BLASLANZE ZUM EINBLASEN VON GASEN IN METALLURGISCHE GEFÄSSE

Title (fr)

PROCEDE ET LANCE DE SOUFFLAGE POUR INJECTER DES GAZ DANS DES CUVES METALLURGIQUES

Publication

EP 1036205 B1 20020925 (DE)

Application

EP 98963387 A 19981124

Priority

  • DE 9803512 W 19981124
  • DE 19755876 A 19971204

Abstract (en)

[origin: US6432165B1] A blowing lance for treating molten metals which are situated in vacuum-treatment vessels, in particular steel in RH vessels, having a central pipe and an encasing pipe which is arranged coaxially with respect to the central pipe and can be cooled by a cooling medium. The central pipe and the encasing pipe are connected to supply lines, which in turn can be connected to an oxygen station, a fuel-gas station and an inert-gas station and to a solids-feed device. In this lance, the cooled encasing pipe is arranged at a distance from the central pipe over its entire length. The free annular area (AR) between the two pipes satisfying the following statementwhere AZ=free cross-sectional area of the central pipe. The end of the central pipe is designed in the form of a Laval nozzle. The nozzle opening of the central pipe is being arranged at a distance (a) inside the encasing tube,where a=0.5 to 0.8xdwhere d=clear diameter of the central pipe.

IPC 1-7

C21C 7/10; C21C 5/46; C21C 5/52; C21C 7/072

IPC 8 full level

C21C 5/46 (2006.01); C21C 5/52 (2006.01); C21C 7/072 (2006.01); C21C 7/10 (2006.01)

CPC (source: EP KR US)

C21C 5/4606 (2013.01 - EP US); C21C 7/10 (2013.01 - EP KR US); F27D 2003/169 (2013.01 - KR)

Designated contracting state (EPC)

AT BE CH DE ES FR GB IT LI NL SE

DOCDB simple family (publication)

US 6432165 B1 20020813; AT E224958 T1 20021015; AU 1869199 A 19990628; AU 748298 B2 20020530; BR 9814253 A 20001003; CA 2312775 A1 19990617; CN 1280630 A 20010117; DE 19755876 A1 19990617; DE 19755876 C2 20000224; DE 59805743 D1 20021031; EP 1036205 A1 20000920; EP 1036205 B1 20020925; ES 2180224 T3 20030201; JP 2001526320 A 20011218; KR 20010032731 A 20010425; WO 9929915 A1 19990617

DOCDB simple family (application)

US 55554600 A 20000815; AT 98963387 T 19981124; AU 1869199 A 19981124; BR 9814253 A 19981124; CA 2312775 A 19981124; CN 98811803 A 19981124; DE 19755876 A 19971204; DE 59805743 T 19981124; DE 9803512 W 19981124; EP 98963387 A 19981124; ES 98963387 T 19981124; JP 2000524485 A 19981124; KR 20007006020 A 20000602