EP 1041171 A1 20001004 - CVD processing chamber
Title (en)
CVD processing chamber
Title (de)
Kammer für CVD-Behandlungen
Title (fr)
Chambre de traitement par CVD
Publication
Application
Priority
- EP 95117865 A 19951113
- US 34827394 A 19941130
Abstract (en)
An apparatus is disclosed which comprises a vacuum processing chamber (133) for processing a substrate; a substrate support (135) for supporting the substrate at a substrate processing location (141) in said vacuum processing chamber (133); a gas inlet for supplying process gas to said processing chamber (133) for processing said substrate; wherein said chamber (133) includes one or more openings (131) in said inner chamber surface (265) which communicate with a vacuum duct (222) in a wall of said chamber (133), said vacuum duct (222) being connected to a vacuum system, wherein said inner chamber surface (265) includes a ceramic lining (234, 236) adjacent to said substrate processing location (141) to prevent a perimeter wall of a body (134) of said processing chamber (133) adjacent said processing location (141) from being directly exposed to a plasma present at said substrate processing location (141) during processing. <IMAGE>
IPC 1-7
IPC 8 full level
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C30B 25/02 (2006.01); H01J 37/32 (2006.01); H01L 21/205 (2006.01); H01L 21/687 (2006.01)
CPC (source: EP KR US)
C23C 16/4401 (2013.01 - EP US); C23C 16/4412 (2013.01 - EP US); C23C 16/45502 (2013.01 - EP US); C23C 16/4586 (2013.01 - EP US); C23C 16/46 (2013.01 - EP US); C23C 16/463 (2013.01 - EP US); C30B 25/02 (2013.01 - EP US); H01J 37/32477 (2013.01 - EP US); H01J 37/32724 (2013.01 - EP US); H01J 37/32834 (2013.01 - EP US); H01L 21/205 (2022.08 - KR); H01L 21/68742 (2013.01 - EP US); H01L 21/68785 (2013.01 - EP US); H01J 2237/022 (2013.01 - EP US); Y10S 438/909 (2013.01 - EP US)
Citation (search report)
- [XY] US 5366585 A 19941122 - ROBERTSON ROBERT [US], et al
- [XA] US 5304279 A 19940419 - COULTAS DENNIS K [US], et al
- [Y] DE 4330266 A1 19940317 - MITSUBISHI ELECTRIC CORP [JP]
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
EP 0714998 A2 19960605; EP 0714998 A3 19961204; EP 0714998 B1 20011024; DE 69523412 D1 20011129; DE 69523412 T2 20020620; DE 69533928 D1 20050217; DE 69533928 T2 20060112; DE 69535114 D1 20060831; DE 69535114 T2 20070215; EP 1041171 A1 20001004; EP 1041171 B1 20060719; EP 1046729 A1 20001025; EP 1046729 B1 20050112; JP H08227859 A 19960903; KR 100279487 B1 20010201; KR 960019503 A 19960617; US 5558717 A 19960924; US 5853607 A 19981229
DOCDB simple family (application)
EP 95117865 A 19951113; DE 69523412 T 19951113; DE 69533928 T 19951113; DE 69535114 T 19951113; EP 00114450 A 19951113; EP 00114451 A 19951113; JP 31265295 A 19951130; KR 19950044587 A 19951129; US 34827394 A 19941130; US 54081295 A 19951011