Global Patent Index - EP 1042794 A1

EP 1042794 A1 20001011 - PROCESS FOR PRODUCING A POROUS LAYER BY AN ELECTROCHEMICAL ETCHING PROCESS

Title (en)

PROCESS FOR PRODUCING A POROUS LAYER BY AN ELECTROCHEMICAL ETCHING PROCESS

Title (de)

VERFAHREN ZUR HERSTELLUNG EINER PORÖSEN SCHICHT MIT HILFE EINES ELEKTROCHEMISCHEN ÄTZPROZESSES

Title (fr)

PROCEDE DE PRODUCTION D'UNE COUCHE POREUSE PAR UN PROCESSUS DE GRAVURE ELECTROCHIMIQUE

Publication

EP 1042794 A1 20001011 (DE)

Application

EP 98966576 A 19981222

Priority

  • DE 9803775 W 19981222
  • DE 19757560 A 19971223

Abstract (en)

[origin: DE19757560A1] In a process for producing a porous layer by an electrochemical etching process, an etching mask which corresponds to the desired course of the deep-etching rate is used. For the course of the deep-etching rate to be continuous, a wedge-shaped etching mask can be selected.

IPC 1-7

H01L 21/306; H01L 21/321; H01L 33/00; C25F 3/12

IPC 8 full level

G02B 1/11 (2015.01); C25F 3/12 (2006.01); G02B 1/118 (2015.01); H01L 21/306 (2006.01); H01L 21/3063 (2006.01); H01L 21/321 (2006.01); H01L 33/34 (2010.01); H01S 5/10 (2006.01)

CPC (source: EP US)

C25F 3/12 (2013.01 - EP US); H01L 21/306 (2013.01 - EP US); H01L 21/321 (2013.01 - EP US); H01L 33/346 (2013.01 - EP US)

Citation (search report)

See references of WO 9934421A1

Designated contracting state (EPC)

CH DE FR GB IT LI NL

DOCDB simple family (publication)

DE 19757560 A1 19990701; CA 2315674 A1 19990708; EP 1042794 A1 20001011; JP 2002500275 A 20020108; US 6398943 B1 20020604; WO 9934421 A1 19990708

DOCDB simple family (application)

DE 19757560 A 19971223; CA 2315674 A 19981222; DE 9803775 W 19981222; EP 98966576 A 19981222; JP 2000526960 A 19981222; US 58169200 A 20000614