Global Patent Index - EP 1048082 A1

EP 1048082 A1 2000-11-02 - CIRCUITRY WITH AT LEAST ONE CAPACITOR AND PROCESS FOR PRODUCING THE SAME

Title (en)

CIRCUITRY WITH AT LEAST ONE CAPACITOR AND PROCESS FOR PRODUCING THE SAME

Title (de)

SCHALTUNGSSTRUKTUR MIT MINDESTENS EINEM KONDENSATOR UND VERFAHREN ZU DESSEN HERSTELLUNG

Title (fr)

CIRCUITERIE COMPRENANT AU MOINS UN CONDENSATEUR, ET PRODUCTION

Publication

EP 1048082 A1 (DE)

Application

EP 98951220 A

Priority

  • DE 9802507 W
  • DE 19750148 A

Abstract (en)

[origin: WO9925026A1] A capacitor is formed in a substrate, in particular made of silicon, of which the main surface has main pores of which the depth exceeds the diameter and whose side walls have side pores with a diameter smaller than that of the main pores by at least one factor 10. The surface of the main pores and side pores is provided with a dielectric layer and a conducting layer. The main pores and the side pores cause the surface to be enlarged, making it possible to produce a capacitor with a specific capacity of between 50 and 500 mu F V/mm<3>.

IPC 1-7 (main, further and additional classification)

H01L 29/94; H01L 21/3063; H01L 21/334

IPC 8 full level (invention and additional information)

H01L 27/04 (2006.01); H01L 21/3063 (2006.01); H01L 21/334 (2006.01); H01L 21/822 (2006.01); H01L 29/92 (2006.01); H01L 21/02 (2006.01)

CPC (invention and additional information)

H01L 29/66181 (2013.01); H01L 21/3063 (2013.01); H01L 28/84 (2013.01)

Citation (search report)

See references of WO 9925026A1

Designated contracting state (EPC)

AT BE CH DE DK ES FI FR GB IE IT LI NL SE

EPO simple patent family

WO 9925026 A1 19990520; EP 1048082 A1 20001102; JP 2001523050 A 20011120

INPADOC legal status


2002-09-11 [18R] REFUSED

- Effective date: 20020420

2001-06-20 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20010504

2000-11-02 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20000411

2000-11-02 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A1

- Designated State(s): AT BE CH DE DK ES FI FR GB IE IT LI NL SE